المؤلفون: Tsuyoshi Furukawa, Anuja De Silva, Luciana Meli, Jing Guo, Dominik Metzler, Indira Seshadri, Ramakrishnan Ayothi, Yann Mignot, Nelson Felix, Dan Corliss, Abraham Arceo de la Pena, Lovejeet Singh, Yongan Xu

المصدر: Advances in Patterning Materials and Processes XXXV.

مصطلحات موضوعية: Materials science, Resist, Extreme ultraviolet lithography, Process window, Nanotechnology, Substrate (printing), Adhesion, Photoresist, Polymer brush, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::41cbf5c74590ace109995f88f7b1f25c
https://doi.org/10.1117/12.2297113

المؤلفون: Dan Corliss, R. Johnson, Christopher F. Robinson, Luciana Meli

المصدر: Extreme Ultraviolet (EUV) Lithography IX.

مصطلحات موضوعية: Scanner, Optics, Materials science, Resist, business.industry, Extreme ultraviolet lithography, Process window, Sensitivity (control systems), Radiation, business, Lithography, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5f9fa5e8194e4743536b74874bf79319
https://doi.org/10.1117/12.2297419

المؤلفون: Bong Cheol Kim, Bassem Hamieh, Genevieve Beique, Karen Petrillo, Eunshoo Han, Erik Verduijn, Lei Sun, Martin Burkhardt, Shinichiro Kawakami, Corey Lemley, Jongsu Kim, Dave Hetzer, Yann Mignot, Andre Labonte, R. Johnson, Stuart A. Sieg, Indira Seshadri, Geng Han, Derren N. Dunn, Nelson Felix, Eric R. Miller, Hao Tang, Koichi Hontake, Anuja De Silva, Yongan Xu, Lior Huli, Dan Corliss, Koichi Matsunaga, Christopher F. Robinson, Mary Breton, Nicole Saulnier, Luciana Meli

المصدر: Extreme Ultraviolet (EUV) Lithography VII.

مصطلحات موضوعية: 010302 applied physics, Process (engineering), Computer science, Extreme ultraviolet lithography, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Engineering physics, Resist, 0103 physical sciences, Multiple patterning, Process window, Node (circuits), IBM, 0210 nano-technology, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0a13233cfa0c903396500e45f9f68353
https://doi.org/10.1117/12.2219894

المؤلفون: Dan Corliss, Timothy A. Brunner, Christopher F. Robinson, Christopher P. Ausschnitt, Nelson Felix, Blandine Minghetti

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Computer science, law, Immersion (virtual reality), Overlay, Photolithography, Simulation, Metrology, Reliability engineering, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::49d0c933b9f2e76edf8e0c9436b6eaad
https://doi.org/10.1117/12.846408

المؤلفون: Christopher F. Robinson, Jeff Bright, Dan Corliss, Bob Lang, Mike Guse, George L. Mack

المصدر: Optical Microlithography XXI.

مصطلحات موضوعية: Lens (optics), Materials science, law, Immersion (virtual reality), Wafer, Nanotechnology, Photolithography, Edge (geometry), Engineering physics, Lithography, Immersion lithography, Next-generation lithography, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::443875d793f23ac7fdf534225fe74e84
https://doi.org/10.1117/12.776363

المؤلفون: Frank Goodwin, John G. Hartley, Yayi Wei, Richard T. Housley, Kevin Cummings, Peter A. Benson, Brian Martinick, Michael Tittnich, Karen Petrillo, Christopher F. Robinson, Dan Corliss, Uzodinma Okoroanyanwu, Christian Schwarz, Stefan Brandl, David Back, Greg Denbeaux, Harry J. Levinson, Dario Gil

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Microprocessor, Engineering, business.industry, law, Electrical engineering, Full field, IBM, business, Lithography, Immersion lithography, Manufacturing engineering, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4d7441747c5f597d8de9c65afb2d4db1
https://doi.org/10.1117/12.663785

المؤلفون: Carlos Fonseca, Jennifer Fullam, Jaione Tirapu-Azpiroz, Ryan Deschner, Timothy A. Brunner, Kit Auschnitt, Peter Vanoppen, Dario Gil, Dan Corliss

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Depth of focus, Engineering, business.industry, Semiconductor device fabrication, Numerical aperture, law.invention, Optics, Optical proximity correction, law, Immersion (virtual reality), Photolithography, business, Lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::22efa994063be4155b3cd33de98df3a0
https://doi.org/10.1117/12.656545

المؤلفون: Mordechai Rothschild, Mark W. Horn, Craig L. Keast, Roderick R. Kunz, Susan C. Palmateer, Scott P. Doran, Anthony R. Forte, Russell B. Goodman, Jan H. C. Sedlacek, Raymond S. Uttaro, Dan Corliss, Andrew Grenville

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.ll.mit.edu/news/journal/pdf/vol10_no1/10_1photolithography.pdf.

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.69.2253; http://www.ll.mit.edu/news/journal/pdf/vol10_no1/10_1photolithography.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.69.2253
http://www.ll.mit.edu/news/journal/pdf/vol10_no1/10_1photolithography.pdf

المؤلفون: Timothy A. Brunner, Dan Corliss, Shahid Butt, Timothy J. Wiltshire, Mark D. Smith, Christopher P. Ausschnitt

المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS. 5:043003

مصطلحات موضوعية: Materials science, Computer science, business.industry, Mechanical Engineering, Bandwidth (signal processing), Physics::Optics, Image processing, Image plane, Condensed Matter Physics, Laser, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, law.invention, Vibration, Wavelength, Optics, Optical proximity correction, law, Chromatic aberration, Chromatic scale, Electrical and Electronic Engineering, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::05e1fc8cb7bda0eb472b930cd465cd1d
https://doi.org/10.1117/1.2396926