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3Academic Journal
المؤلفون: Döring, Hans-Joachim
المصدر: südostasien informationen; Bd. 10 Nr. 1 (1994): südostasien informationen; 63-64
وصف الملف: application/pdf
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5Conference
المؤلفون: Mohaupt, Matthias, Beckert, Erik, Burkhardt, Thomas, Hornaff, Marcel, Damm, Christoph, Eberhardt, Ramona, Tünnermann, Andreas, Döring, Hans-Joachim, Reimer, Klaus
المساهمون: Fraunhofer Institute for Applied Optics and Precision Engineering Jena (Fraunhofer IOF), Fraunhofer (Fraunhofer-Gesellschaft), Vistec Electron Beam GmbH, Fraunhofer Institute for Silicon Technology (Fraunhofer ISIT), Svetan Ratchev, TC 5, WG 5.5
المصدر: IFIP Advances in Information and Communication Technology ; 6th International Precision Assembly Seminar (IPAS) ; https://hal.inria.fr/hal-01363878 ; 6th International Precision Assembly Seminar (IPAS), Feb 2012, Chamonix, France. pp.42-50, ⟨10.1007/978-3-642-28163-1_6⟩
مصطلحات موضوعية: multi shaped beam lithography, multi deflection array, MEMS assembly, precision alignment, [INFO]Computer Science [cs]
Relation: hal-01363878; https://hal.inria.fr/hal-01363878; https://hal.inria.fr/hal-01363878/document; https://hal.inria.fr/hal-01363878/file/978-3-642-28163-1_6_Chapter.pdf
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6Academic Journal
المؤلفون: Döring, Hans-Joachim
المصدر: Peripherie. 2022, Vol. 42 Issue 165/166, p11-30. 20p.
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7Book
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8Academic Journal
المؤلفون: Döring, Hans-Joachim
المصدر: Vierteljahrshefte für Zeitgeschichte, 1959 Oct 01. 7(4), 418-428.
URL الوصول: https://www.jstor.org/stable/30196203
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9Conference
المؤلفون: Gramss, Juergen, Weidenmueller, Ulf, Stoeckel, Arnd, Jaritz, Renate, Doering, Hans-Joachim, Boettcher, Monika
المساهمون: Behringer, Uwe F.W.
المصدر: 27th European Mask and Lithography Conference ; SPIE Proceedings ; ISSN 0277-786X
الاتاحة: http://dx.doi.org/10.1117/12.896883
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10Conference
المساهمون: Herr, Daniel J. C.
المصدر: Alternative Lithographic Technologies III ; SPIE Proceedings ; ISSN 0277-786X
الاتاحة: http://dx.doi.org/10.1117/12.879446
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11Conference
المساهمون: Montgomery, M. Warren, Maurer, Wilhelm
المصدر: SPIE Proceedings ; Photomask Technology 2010 ; ISSN 0277-786X
الاتاحة: http://dx.doi.org/10.1117/12.868977
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12Conference
المؤلفون: Gramss, Juergen, Stoeckel, Arnd, Weidenmueller, Ulf, Doering, Hans-Joachim, Bloecker, Martin, Sczyrba, Martin, Finken, Michael, Wandel, Timo, Melzer, Detlef
المساهمون: Montgomery, M. Warren, Maurer, Wilhelm
المصدر: SPIE Proceedings ; Photomask Technology 2010 ; ISSN 0277-786X
الاتاحة: http://dx.doi.org/10.1117/12.865708
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13Conference
المساهمون: Herr, Daniel J. C.
المصدر: SPIE Proceedings ; Alternative Lithographic Technologies II ; ISSN 0277-786X
الاتاحة: http://dx.doi.org/10.1117/12.846529
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14Conference
المساهمون: Schellenberg, Frank M., La Fontaine, Bruno M.
المصدر: Alternative Lithographic Technologies ; SPIE Proceedings ; ISSN 0277-786X
الاتاحة: http://dx.doi.org/10.1117/12.814113
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15Conference
المؤلفون: Stolberg, Ines, Pain, Laurent, Kretz, Johannes, Boettcher, Monika, Doering, Hans-Joachim, Gramss, Juergen, Hahmann, Peter
المصدر: 23rd European Mask and Lithography Conference ; SPIE Proceedings ; ISSN 0277-786X
الاتاحة: http://dx.doi.org/10.1117/12.736974
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16Conference
المؤلفون: Doering, Hans-Joachim, Elster, Thomas, Heinitz, Joachim, Fortagne, Olaf, Brandstaetter, Christoph, Haugeneder, Ernst, Eder-Kapl, Stefan, Lammer, Gertraud, Loeschner, Hans, Reimer, Klaus, Eichholz, Joerg, Saniter, Juergen
المساهمون: Mackay, R. Scott
المصدر: SPIE Proceedings ; Emerging Lithographic Technologies IX ; ISSN 0277-786X
الاتاحة: http://dx.doi.org/10.1117/12.600458
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17Conference
المؤلفون: Brandstaetter, Christoph, Haugeneder, Ernst, Doering, Hans-Joachim, Elster, Thomas, Heinitz, Joachim, Fortagne, Olaf, Eder-Kapl, Stefan, Lammer, Gertraud, Jochl, Peter, Loeschner, Hans, Reimer, Klaus, Saniter, Juergen, Talmi, Maati, Eberhardt, Ramona, Kroenert, Klaus
المصدر: SPIE Proceedings ; 21st European Mask and Lithography Conference ; ISSN 0277-786X
الاتاحة: http://dx.doi.org/10.1117/12.637298
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18Academic Journal
المؤلفون: Risse, Stefan, Damm, Christoph, Hornaff, Marcel, Kamm, Andreas, Mohaupt, Matthias, Eberhardt, Ramona, Schmidt, Ingo, Ramm, Roland, Kühmstedt, Peter, Notni, Gunther, Döring, Hans-Joachim, Elster, Thomas, Kirschstein, Ulf Carsten, Schenk, Christoph
مصطلحات موضوعية: electron beam lithography, wire deflector, electron-optical column, precision assembly, solderjet bumping multi shaped beam, computed tomography measurement
Time: 620, 621
Relation: International Conference on Micro- and Nano-Engineering (MNE) 2011; Microelectronic engineering; https://publica.fraunhofer.de/handle/publica/229056
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19Conference
المؤلفون: Lemke, Melchior, Gramss, Juergen, Doering, Hans-Joachim, Eichhorn, Hans, Schubert, Gerhard
المساهمون: Behringer, Uwe F. W.
المصدر: SPIE Proceedings ; 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents ; ISSN 0277-786X
الاتاحة: http://dx.doi.org/10.1117/12.377107
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20Book