المؤلفون: Clyde Browning, Benjamin Uhlig, Norbert Hanisch, Michael Friedrich, Varvara Brackmann

المصدر: 35th European Mask and Lithography Conference (EMLC 2019).

مصطلحات موضوعية: Point spread function, symbols.namesake, Materials science, Resist, Proximity effect (electron beam lithography), Scattering, Gaussian, Astrophysics::Instrumentation and Methods for Astrophysics, symbols, Gaussian function, Secondary electrons, Electron-beam lithography, Computational physics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ef77a5393478275c98db0dac255c0215
https://doi.org/10.1117/12.2534642

المؤلفون: Patrick Schiavone, Serguei Postnikov, Sébastien Bayle, Clyde Browning, Matthieu Milléquant

المساهمون: Aselta Nanographics, Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])

المصدر: Proc. SPIE
34th European Mask and Lithography Conference
34th European Mask and Lithography Conference, Jun 2018, Grenoble, France. pp.107750K, ⟨10.1117/12.2326599⟩

مصطلحات موضوعية: Data processing, Curvilinear coordinates, Computer science, Computation, Process (computing), 02 engineering and technology, 030218 nuclear medicine & medical imaging, Reduction (complexity), 03 medical and health sciences, File size, 020210 optoelectronics & photonics, 0302 clinical medicine, Convergence (routing), 0202 electrical engineering, electronic engineering, information engineering, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Representation (mathematics), Algorithm, ComputingMilieux_MISCELLANEOUS, ComputingMethodologies_COMPUTERGRAPHICS

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c9c9f5cf80f18ea8cd20919f6dff82c8
https://doi.org/10.1117/12.2326599

المؤلفون: Clyde Browning, Jerome Hazart, Aurélien Fay, Ludovic Lattard, Jacky Chartoire, Patrick Schavione, Alexandre Chagoya, Pieter Brandt, Mohamed Saib, Sébastien Bérard-Bergery, Sergei Postnikov

المساهمون: Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Aselta Nanographics, Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])

المصدر: Proc. SPIE
SPIE Advanced Lithography
SPIE Advanced Lithography, 2016, San Jose, United States. pp.977714, ⟨10.1117/12.2219178⟩

مصطلحات موضوعية: 010302 applied physics, business.industry, Computer science, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, Resist, law, 0103 physical sciences, Process window, Wafer, Stepper, Photolithography, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 0210 nano-technology, business, Lithography, Massively parallel, Computer hardware, Electron-beam lithography, Maskless lithography, ComputingMilieux_MISCELLANEOUS

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::55c2787ea64254e9c835d3259d5d6db9
https://hal.science/hal-02332442

المؤلفون: Thiago Figueiro, Xaver Thrun, Clyde Browning, Kang-Hoon Choi, Patrick Schiavone, Christoph Hohle, Johann W. Bartha, Mohamed Saib

المساهمون: Fraunhofer Institute for Photonic Microsystems (Fraunhofer IPMS), Fraunhofer (Fraunhofer-Gesellschaft), Aselta Nanographics

المصدر: Proc. SPIE
SPIE Photomask Technology
SPIE Photomask Technology, Oct 2015, Monterey, United States. pp.963515, ⟨10.1117/12.2197175⟩

مصطلحات موضوعية: Point spread function, Proximity effect correction, Statistics, Calibration, Variance (accounting), Sensitivity (control systems), [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Algorithm, ComputingMilieux_MISCELLANEOUS, Data preparation, Mathematics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b9b3697c8a2bbdc952084b8091bc0480
https://doi.org/10.1117/12.2197175

المؤلفون: J. Bustos, Jean-Christophe Marusic, Sébastien Pauliac, Thomas Quaglio, Thiago Figueiro, Aurélien Fay, Clyde Browning, Patrick Schiavone, Jerome Belledent

المساهمون: Aselta Nanographics, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)

المصدر: Proc. SPIE
SPIE Photomask Technology
SPIE Photomask Technology, Oct 2014, Monterey, United States. pp.92350V, ⟨10.1117/12.2069335⟩

مصطلحات موضوعية: 010302 applied physics, Curvilinear coordinates, Data processing, Engineering, business.industry, Shot (filmmaking), ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Variable (computer science), 0103 physical sciences, Electronic engineering, Enhanced Data Rates for GSM Evolution, Photonics, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 0210 nano-technology, business, Lithography, Electron-beam lithography, ComputingMilieux_MISCELLANEOUS, ComputingMethodologies_COMPUTERGRAPHICS

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c760f529a6f19c9653287476e868e2a0
https://hal.science/hal-02362243

المؤلفون: Thiago Figueiro, Michael Kaiser, Christoph Hohle, Clyde Browning, Kang-Hoon Choi, Patrick Schiavone

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Engineering, Optics, Software, Resist, business.industry, Rounding, Process (computing), Cathode ray, Node (circuits), business, Lithography, Electron-beam lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::51a50db49a60b6d501c19538b2689ab3
https://doi.org/10.1117/12.2066156

المؤلفون: Christoph Hohle, Thiago Figueiro, Patrick Schiavone, Jean-Hervé Tortai, Kang-Hoon Choi, Cyril Vannuffel, M J Thornton, Clyde Browning

المساهمون: ASELTA, Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Laboratoire des technologies de la microélectronique (LTM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS), Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)

المصدر: Proc. SPIE 8886, 29th European Mask and Lithography Conference
Proc. SPIE 8886, 29th European Mask and Lithography Conference, 2013, pp.88860F. ⟨10.1117/12.2030664⟩

مصطلحات موضوعية: 010302 applied physics, Point spread function, Engineering, business.industry, Process (computing), 02 engineering and technology, 01 natural sciences, 020202 computer hardware & architecture, Compensation (engineering), File size, 13. Climate action, 0103 physical sciences, Modulation (music), 0202 electrical engineering, electronic engineering, information engineering, Range (statistics), Electronic engineering, Point (geometry), Node (circuits), business, Algorithm, ComputingMilieux_MISCELLANEOUS

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::651da731d9cedeaaad92e83fd7e5480a
https://doi.org/10.1117/12.2030664

المؤلفون: Clyde Browning, Russell Cinque, Luc Martin, Patrick Schiavone, Paolo Petroni, Tadashi Komagata, Taiichi Kiuchi, Thomas Quaglio

المساهمون: JEOL USA, JEOL Ltd, 1156 Nakagami, Akishima, Tokyo 196-0022, Japan., Aselta Nanographics

المصدر: Proc. SPIE
SPIE Photomask Technology
SPIE Photomask Technology, Sep 2013, Monterey, United States. pp.88801F, ⟨10.1117/12.2028944⟩

مصطلحات موضوعية: 010302 applied physics, Engineering, business.industry, media_common.quotation_subject, Fidelity, 01 natural sciences, 010309 optics, Reduction (complexity), Software, Digital pattern generator, Shot (pellet), 0103 physical sciences, Electronic engineering, Fraction (mathematics), [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, business, Throughput (business), Algorithm, Dram, ComputingMilieux_MISCELLANEOUS, ComputingMethodologies_COMPUTERGRAPHICS, media_common

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2de1c52b886d0de03f4c13acdafe4d9e
https://hal.archives-ouvertes.fr/hal-02362282

المؤلفون: Cyril Vannufel, Thiago Figueiro, Clyde Browning, Patrick Schiavone, M J Thornton

المصدر: Alternative Lithographic Technologies V.

مصطلحات موضوعية: Point spread function, Computer science, business.industry, Scattering, Compensation (engineering), Optics, Chemical-mechanical planarization, Line (geometry), Reticle, Range (statistics), Point (geometry), business, Electron scattering, Electron-beam lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b8abe2827c66bdcd12087e7bd3c91b8e
https://doi.org/10.1117/12.2011835

المؤلفون: Vincent Farys, Clyde Browning, Luc Martin, Tadahiko Takikawa, Naoya Hayashi, Patrick Schiavone, Shogo Narukawa, Frank Sundermann

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Engineering, Software, Computer engineering, Optical proximity correction, business.industry, Face (geometry), Electrical engineering, Process (computing), Process control, Photomask, Mask data preparation, business, Energy (signal processing)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::91b78f17fa0009b84787e2ed82230c58
https://doi.org/10.1117/12.981609

المؤلفون: Richard Johannes Franciscus Van Haren, Rob Morton, Henry Megens, Paul Christiaan Hinnen, Kevin E. Cooper, Clyde Browning, Jerome Depre, Ramon Navarro, Scott Warrick, Pierre-Olivier Sassoulas, Doug Reber

المصدر: Optical Microlithography XVIII.

مصطلحات موضوعية: Engineering, business.industry, Electrical engineering, Stacking, chemistry.chemical_element, Overlay, Copper, Back end of line, Scanning probe microscopy, chemistry, Signal strength, Robustness (computer science), Copper metal, business, Computer hardware

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::48aa27bfc71782b7a1c69a59d40dcd3a
https://doi.org/10.1117/12.599807