المؤلفون: Zhong Li, Viktor Kampitakisa, Youngjun Her, Charito Antonio, Takanori Kudo, Salem Mullen, Elayaraja Muthuswamy, Orest Polishchuk, Adam Ware, Elizabeth Wolfer, Dong Yang, JoonYeon Cho, Aritaka Hishida

المصدر: Journal of Photopolymer Science and Technology. 2024, 37(3):327-333

المؤلفون: Takanori Kudo, JoonYeon Cho, Aritaka Hishida, Salem Mullen, Elizabeth Wolfer, Orest Polishchuk, Charito Antonio, Zhong Li

المصدر: Journal of Photopolymer Science and Technology. 2024, 37(3):321-326

المؤلفون: Charito Antonio, Clement Anyadiegwu, Deepa Parthasarathy, Feederick Lam, Fimiaki Iwasaki, Guanyang Lin, Masao Yamaguchi, Murirathna Padmanaban, Ralph Dammel, Shenggao Liu, Srinivasan Chakrapani, Takanori Kudo, Takayuki Maehara

المصدر: Journal of Photopolymer Science and Technology. 2007, 20(5):719

المؤلفون: Alberto Dioses, Charito Antonio, Deepa Parthasarathy, Edward Ng, Kazuma Yamamoto, Mark Neisser, Murirathna Padmanaban, Richard Collett, Shinji Miyazaki, Srinivasan Chakrapani, Takanori Kudo, Yasushi Akiyama

المصدر: Journal of Photopolymer Science and Technology. 2010, 23(5):731

المؤلفون: Deepa Parthasarathy, Alberto D. Dioses, Richard Collett, Mark Neisser, Munirathna Padmanaban, Edward Ng, Charito Antonio, Srinivasan Chakrapani, Takanori Kudo

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Plasma etching, Materials science, Silicon, business.industry, chemistry.chemical_element, engineering.material, Optics, Coating, chemistry, Resist, Cleave, engineering, Optoelectronics, Process optimization, business, Silicon oxide, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7d988dd7504829aee19cbfd5c99840d9
https://doi.org/10.1117/12.846313

المؤلفون: Shinji Miyazaki, Deepa Parthasarathy, Yuki Ubayashi, Edward Ng, Charito Antonio, Yasushi Akiyama, Takanori Kudo, Richard Collett, Alberto D. Dioses, Kazuma Yamamoto, Munirathna Padmanaban, Mark Neisser, Srinivasan Chakrapani

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Anti-reflective coating, Plasma etching, Materials science, Resist, law, Cleave, Nanotechnology, Lithography, Material technology, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::64b99e16de343d3a3106dc1a3801ae10
https://doi.org/10.1117/12.837050

المؤلفون: Muthiah Thiyagarajan, Munirathna Padmanaban, SungEun Hong, Charito Antonio, Deepa Parthasarathy, John P. Sagan, Srinivasan Chakrapani, Yi Cao, Takanori Kudo

المصدر: Advances in Resist Materials and Processing Technology XXVI.

مصطلحات موضوعية: Optics, Materials science, Resist, business.industry, Thermal, Flow (psychology), Mixing (process engineering), Process window, Surface finish, Composite material, Contact hole, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f622d64a84049759f7c9bd611161078f
https://doi.org/10.1117/12.816633

المؤلفون: Francis M. Houlihan, Munirathna Padmanaban, Deepa Parthasarathy, Lin Zhang, Ping-Hung Lu, Takanori Kudo, Sumathy Vasanthan, Alberto D. Dioses, Srinivasan Chakrapani, Meng Li, Mark Neisser, Charito Antonio, Edward Ng

المصدر: Advances in Resist Materials and Processing Technology XXVI.

مصطلحات موضوعية: Plasma etching, Materials science, business.industry, Nanotechnology, engineering.material, Radiation, law.invention, Anti-reflective coating, Coating, Stack (abstract data type), Resist, law, Trench, engineering, Optoelectronics, business, Dissolution

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9a460151ffa001f3e1b21c518c88d31e
https://doi.org/10.1117/12.816375

المؤلفون: Shenggao Liu, Guanyang Lin, Clement Anyadiegwu, Charito Antonio, Ralph R. Dammel, Frederick W. Lam, Masao Yamagchi, Munirathna Padmanaban, Srinivasan Chakrapani, Takayuki Maehara, Anthony Waitz, Takanori Kudo, Dalil Rahman, Deepa Parthasarathy

المصدر: SPIE Proceedings.

مصطلحات موضوعية: chemistry.chemical_classification, chemistry.chemical_compound, Acrylate, Materials science, Monomer, chemistry, Chemical engineering, Adamantane, Polymer, Photoresist, Diamondoid, Methacrylate, Diamantane

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::426d9ce47345cde0ff90d22094d15f3a
https://doi.org/10.1117/12.713111

المؤلفون: Guanyang Lin, Deepa Parthasarathy, Srinivasan Chakrapani, Munirathna Padmanaban, Charito Antonio, Clement Anyadiegwu, Takanori Kudo, Ralph R. Dammel

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Surface finish, Semiconductor device, Dark field microscopy, law.invention, Optics, Resist, law, Transmittance, Photolithography, business, Lithography, Aerial image

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5ddb85f6ee2315ea4515455f1b5573b1
https://doi.org/10.1117/12.713221