نتائج البحث - "Chang, Hyo Sik"

المساهمون: Korea Institute of Energy Technology Evaluation and Planning, National Research Foundation of Korea, MOE Research Center for Online Education

المصدر: Small ; volume 20, issue 37 ; ISSN 1613-6810 1613-6829

الاتاحة: https://doi.org/10.1002/smll.202402268
https://onlinelibrary.wiley.com/doi/pdf/10.1002/smll.202402268

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5

Academic Journal

Enhancing performance of heterojunction silicon solar cells through atomic-layer-deposited MoOx hole contact and atomic-layer-deposited AlZnO layer

المؤلفون: Jeong, Minji, Park, Jihye, Cho, Young Jun, Chang, Hyo Sik

المصدر: Vacuum ; volume 222, page 113000 ; ISSN 0042-207X

الاتاحة: http://dx.doi.org/10.1016/j.vacuum.2024.113000
https://api.elsevier.com/content/article/PII:S0042207X24000460?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0042207X24000460?httpAccept=text/plain

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6

Academic Journal

Analysis of electrical and thermal characteristics of PV array under mismatching conditions caused by partial shading and short circuit failure of bypass diodes

المؤلفون: Lee, Chung Geun, Shin, Woo Gyun, Lim, Jong Rok, Kang, Gi Hwan, Ju, Young Chul, Hwang, Hye Mi, Chang, Hyo Sik, Ko, Suk Whan

المساهمون: Korea Institute of Energy Technology Evaluation and Planning, KETEP

المصدر: Energy ; volume 218, page 119480 ; ISSN 0360-5442

الاتاحة: http://dx.doi.org/10.1016/j.energy.2020.119480
https://api.elsevier.com/content/article/PII:S0360544220325871?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0360544220325871?httpAccept=text/plain

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7

Academic Journal

Elucidating Interfacial Hole Extraction and Recombination Kinetics in Perovskite Thin Films.

المؤلفون: Kim, Sunkyu, Lee, Wonjong, Irshad, Zobia, Yun, Siwon, Han, Hyeji, Adnan, Muhammad, Chang, Hyo Sik, Lim, Jongchul

المصدر: Energies (19961073); May2024, Vol. 17 Issue 9, p2062, 14p

مصطلحات موضوعية: THIN films, PEROVSKITE, INTERFACE dynamics, TRANSPORT theory, CONCENTRATION gradient, CHARGE carrier mobility, CHARGE density waves, OPEN-circuit voltage

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8

Academic Journal

Investigation of tetrakis(ethylmethylamido)hafnium adsorption mechanism in initial growth of atomic layer deposited-HfO2 thin films on H-/OH-terminated Si (100) surfaces.

المؤلفون: Park, Jihye, Jeong, Minji, Cho, Young Joon, Kim, Kyung Joong, Tai, Truong Ba, Shin, Hyeyoung, Lim, Jong Chul, Chang, Hyo Sik

المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Dec2023, Vol. 41 Issue 6, p1-9, 9p

مصطلحات موضوعية: DYNAMIC random access memory, THIN films, SECONDARY ion mass spectrometry, ATOMIC layer deposition, HAFNIUM, LIGHT scattering

9

Academic Journal

Improved passivation performance of Al2O3 interlayer/MoOX thin films continuously grown via atomic layer deposition

المؤلفون: Jeong, Minji, Park, Jihye, Cho, Young Joon, Chang, Hyo Sik

المساهمون: KETEP, Korea Semiconductor Research Consortium, Ministry of Trade, Industry and Energy, Korea Evaluation Institute of Industrial Technology

المصدر: Thin Solid Films ; volume 766, page 139667 ; ISSN 0040-6090

الاتاحة: http://dx.doi.org/10.1016/j.tsf.2022.139667
https://api.elsevier.com/content/article/PII:S0040609022005697?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0040609022005697?httpAccept=text/plain

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