يعرض 1 - 20 نتائج من 541 نتيجة بحث عن '"CATHODE SPUTTERING"', وقت الاستعلام: 0.56s تنقيح النتائج
  1. 1
    Academic Journal
    FePtC magnetic recording media with (200) textured MoC intermediate layer.

    المؤلفون: Jai-Lin Tsai1, Yun-Ting Tseng1 tsaijl@dragon.nchu.edu.tw, Chia-Ru Li1, Sheng-Chun Fu1

    المصدر: Journal of Applied Physics. 2015, Vol. 117 Issue 17, p17C502-1-17C502-4. 4p. 2 Color Photographs, 2 Diagrams, 3 Graphs.

    مصطلحات موضوعية: *MAGNETRON sputtering, *CATHODE sputtering (Plating process), *CARBON foams, *ANISOTROPY, *MATHEMATICAL models, *COERCIVE fields (Electronics)


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  2. 2
    Academic Journal
    Molybdenum angular sputtering distribution under low energy xenon ion bombardment.

    المؤلفون: Oyarzabal, E.1 eoyarzabal@ferp.ucsd.edu, Yu, J. H.1, Doerner, R. P.1, Tynan, G. R.1, Schmid, K.2

    المصدر: Journal of Applied Physics. 9/15/2006, Vol. 100 Issue 6, p063301. 6p. 3 Diagrams, 1 Chart, 5 Graphs.

    مصطلحات موضوعية: *MOLYBDENUM, *CATHODE sputtering (Plating process), *PLASMA gases, *NUCLEAR quadrupole resonance spectroscopy, *ANGULAR distribution (Nuclear physics), *MONTE Carlo method, *XENON spectra


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  3. 3
    Academic Journal
    Effect of sputtering rate and ion irradiation on the microstructure and magnetic properties of Ni/Si3N4 multilayers.

    المؤلفون: Vila, M.1, Prieto, C.1 cprieto@icmm.csic.es, Traverse, A.2, Ramírez, R.3

    المصدر: Journal of Applied Physics. 12/1/2005, Vol. 98 Issue 11, p113507. 12p. 3 Charts, 9 Graphs.

    مصطلحات موضوعية: *SPUTTERING (Physics), *CATHODE sputtering (Plating process), *COLLISIONS (Nuclear physics), *SURFACES (Technology), *IRRADIATION, *MAGNETIC properties, *ELECTROMAGNETIC induction, *EXTENDED X-ray absorption fine structure, *ABSORPTION spectra, *X-ray spectroscopy


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  4. 4
    Academic Journal
    Dynamics of processes during the deposition of ZrO2 films by controlled reactive high-power impulse magnetron sputtering: A modelling study.

    المؤلفون: Kozáka, Tomáš, Vlček, Jaroslav

    المصدر: Journal of Applied Physics; 2017, Vol. 122 Issue 3, p1-9, 9p, 2 Diagrams, 1 Chart, 7 Graphs

    مصطلحات موضوعية: MAGNETRON sputtering, PHYSICAL vapor deposition, SPUTTERING (Physics), CATHODE sputtering (Plating process), THIN films


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  5. 5
    Academic Journal
    Vacuum-plasma processes at extreme field emission in diamond electron sources

    المؤلفون: Yafarov, Ravil' Kiashshafovich, Nefedov, Denis Vladimirovich, Storublev, Anton Vyacheslavovich

    المصدر: Известия Саратовского университета. Новая серия Серия: Физика, Vol 21, Iss 1, Pp 69-79 (2021)

    مصطلحات موضوعية: high-current field emission of electrons, nanocarbon composite, diamond crystallites, cathode torch, cathode sputtering, Physics, QC1-999

    وصف الملف: electronic resource

    Relation: https://fizika.sgu.ru/sites/fizika.sgu.ru/files/text-pdf/2021/03/fizika_2021_1_69-79.pdf; https://doaj.org/toc/1817-3020; https://doaj.org/toc/2542-193X

    URL الوصول: https://doaj.org/article/c5fbd061135a4098854fa8d22da4ad1c

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  6. 6
    Academic Journal
    Development of Wide-Angle Short-Wave Pass Thin Film Based on the Ultra-Thin Silicate Glass

    المؤلفون: Xiuhua Fu, Suotao Dong, Shifu Xiong, Cheng Li, Xiaodong Chen

    المصدر: Materials; Volume 15; Issue 13; Pages: 4706

    مصطلحات موضوعية: laser medical treatment, wide-angle, cathode sputtering, short-wave pass filter film, film peeling, hundreds grid fastness test

    وصف الملف: application/pdf

    Relation: Biomaterials; https://dx.doi.org/10.3390/ma15134706

    الاتاحة: https://doi.org/10.3390/ma15134706

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  7. 7
    Academic Journal
    Influence of AMF on the Expansion Speed of Cathode Spots in High-Current Triggered Vacuum Arc.

    المؤلفون: Song, Xiaochuan1, Shi, Zongqian1, Liu, Chang1, Jia, Shenli1, Wang, Lijun1

    المصدر: IEEE Transactions on Plasma Science. Aug2013 Part 2, Vol. 41 Issue 8, p2061-2067. 7p.

    مصطلحات موضوعية: *QUANTITATIVE research, CATHODE sputtering (Plating process), MAGNETIC fields, VACUUM arcs, THERMAL conductivity


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  8. 8
    Academic Journal
    Technological Methods of Forming Thin Semiconductor Layers Part 3. Сathode Sputtering

    المؤلفون: B. Tsizh, Z. Dziamski

    المصدر: Науковий вісник Львівського національного університету ветеринарної медицини та біотехнологій імені С.З. Ґжицького. Серія: Харчові технології, Vol 22, Iss 93, Pp 15-17 (2020)

    مصطلحات موضوعية: thin films, semiconductors, technological methods of obtaining, condensation in a vacuum, thermal spraying, cathode sputtering, Food processing and manufacture, TP368-456

    وصف الملف: electronic resource

    Relation: https://nvlvet.com.ua/index.php/food/article/view/3930; https://doaj.org/toc/2519-268X; https://doaj.org/toc/2707-5885

    URL الوصول: https://doaj.org/article/629882f4cc0949208cde939eea3278c9

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  9. 9
    Academic Journal
    Hybrid Functional Calculation of Defects in Pseudo-binary Indium Oxynitride.

    المؤلفون: Amnuyswat, Kittiphong1 kakittip@kmitl.ac.th, Thanomngam, Pittiporn1,2

    المصدر: Journal of the Chinese Chemical Society. Jun2016, Vol. 63 Issue 6, p539-544. 6p.

    مصطلحات موضوعية: *MAGNETRON sputtering, *CATHODE sputtering (Plating process), *CRYSTALLOGRAPHY, *CRYSTALLIZATION, *DENSITY functionals


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  10. 10
    Academic Journal
    Magnetic properties of in-plane oriented barium hexaferrite thin films prepared by direct current magnetron sputtering.

    المؤلفون: Xiaozhi Zhang, Zhenxing Yue, Siqin Meng, Lixin Yuan

    المصدر: Journal of Applied Physics; 12/28/2014, Vol. 116 Issue 24, p243909-1-243909-6, 6p, 1 Color Photograph, 2 Diagrams, 1 Chart, 4 Graphs

    مصطلحات موضوعية: MAGNETIC properties, MAGNETIC entropy, ELLIPSOMETRY, THIN films, CATHODE sputtering (Plating process)


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  11. 11
    Academic Journal
    Method of arc activation of the base at increasing the distance plasma spraying ; Метод дуговой активации основы при увеличении дистанции плазменного напыления ; Метод дугової активації основи при збільшенні дистанції плазмового напилення

    المؤلفون: Єршов, А.В., Зеленіна, О.А.

    المصدر: New Materials and Technologies in Metallurgy and Mechanical Engineering; No. 1 (2021); 54-58 ; Новые материалы и технологии в металлургии и машиностроении; № 1 (2021); 54-58 ; Нові матеріали і технології в металургії та машинобудуванні; № 1 (2021); 54-58 ; 2786-7358 ; 1607-6885

    مصطلحات موضوعية: плазмове покриття, катодне розпилення, міцність зчеплення, іонно-дугова активація, поверхневі оксиди, дистанція нанесення покриття, плазменное покрытие, катодное распыление, прочность сцепления, ионно-дуговая активация, поверхностные оксиды, дистанция нанесения покрытия, plasma coating, cathode sputtering, bond strength, ion-arc activation, surface oxides, coating distance

    وصف الملف: application/pdf

    Relation: http://nmt.zntu.edu.ua/article/view/240000/238389; http://nmt.zntu.edu.ua/article/view/240000

    الاتاحة: http://nmt.zntu.edu.ua/article/view/240000

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  12. 12
    Academic Journal
    Practical and Economical Effects of the Use of Screen Meshes for Steel Nitriding Processes with Glow Plasma

    المؤلفون: Jerzy Pisarek, Tadeusz Frączek, Tomasz Popławski, Michał Szota

    المصدر: Energies; Volume 14; Issue 13; Pages: 3808

    مصطلحات موضوعية: energy saving, innovative metallic coatings, DC plasma discharge, processing electrical parameters, glow discharge nitriding, vapour deposition, cathode sputtering

    وصف الملف: application/pdf

    Relation: A1: Electrical Power System; https://dx.doi.org/10.3390/en14133808

    الاتاحة: https://doi.org/10.3390/en14133808

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  13. 13
    Academic Journal
    Simulation of cathode surface sputtering by ions and fast atoms in Townsend discharge in argon-mercury mixture with temperature-dependent composition

    المؤلفون: G. G. Bondarenko, V. I. Kristya, D. O. Savichkin, P. Żukowski

    المصدر: Pribory i Metody Izmerenij, Vol 9, Iss 3, Pp 227-233 (2018)

    مصطلحات موضوعية: gas discharge lamp, low-current discharge, argon-mercury mixture, ion and atom energy spectra, cathode sputtering, Engineering (General). Civil engineering (General), TA1-2040

    وصف الملف: electronic resource

    Relation: https://pimi.bntu.by/jour/article/view/387; https://doaj.org/toc/2220-9506; https://doaj.org/toc/2414-0473

    URL الوصول: https://doaj.org/article/f226ea01204e49e4844cc702dbf29c97

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  14. 14
    Academic Journal
    Optical characterization of a-As2S3 thin films prepared by magnetron sputtering.

    المؤلفون: Tan, W. C., Solmaz, M. E., Gardner, J., Atkins, R., Madsen, C.

    المصدر: Journal of Applied Physics; Feb2010, Vol. 107 Issue 3, p033524-033530, 6p, 1 Color Photograph, 1 Diagram, 3 Charts, 7 Graphs

    مصطلحات موضوعية: PHYSICS research, THIN films, MAGNETRON sputtering, SPUTTERING (Physics), PHYSICAL vapor deposition, CATHODE sputtering (Plating process), SEMICONDUCTOR industry


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  15. 15
    Academic Journal
    Microstructure and nonbasal-plane growth of epitaxial Ti2AlN thin films.

    المؤلفون: Beckers, M., Schell, N., Martins, R. M. S., Mücklich, A., Möller, W., Hultman, L.

    المصدر: Journal of Applied Physics; 2/1/2006, Vol. 99 Issue 3, p034902, 8p, 3 Black and White Photographs, 3 Diagrams, 2 Graphs

    مصطلحات موضوعية: MICROSTRUCTURE, EPITAXY, THIN films, CRYSTALS, NUCLEATION, SPUTTERING (Physics), CATHODE sputtering (Plating process)


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  16. 16
    Conference
    A novel thin film dispenser cathode for thermionic emission.

    المؤلفون: Zavadil, K. R., King, D. B., Ruffner, J. A.

    المصدر: AIP Conference Proceedings. 2001, Vol. 552 Issue 1, p1165. 6p.

    مصطلحات موضوعية: *THIN films, *CATHODE sputtering (Plating process)


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  17. 17
    Academic Journal
    Modeling the extraction of sputtered metal from high power impulse hollow cathode discharges.

    المؤلفون: Hasan, M. I.1,2, Pilch, I.2, Söderström, D.2, Lundin, D.1, Helmersson, U.2, Brenning, N.1 nils.brenning@ee.kth.se

    المصدر: Plasma Sources Science & Technology. Jun2013, Vol. 22 Issue 3, p1-12. 12p.

    مصطلحات موضوعية: *CATHODE sputtering (Plating process), *CATHODE ray tubes, *GAS flow, *IONIZATION (Atomic physics), *NANOPARTICLE synthesis, *SPUTTERING (Physics)


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  18. 18
    Academic Journal
    Voluminous high-density plasma generator based on high-current pulsed magnetron discharge.

    المؤلفون: Kozyrev, A.1 kozyrev@to.hcei.tsc.ru, Sochugov, N.2, Zakharov, A.1, Oskirko, V.2, Semenov, V.1, Semenyuk, N.1

    المصدر: Russian Physics Journal. Jul2012, Vol. 55 Issue 2, p195-201. 7p. 1 Diagram, 6 Graphs.

    مصطلحات موضوعية: *MAGNETRON sputtering, *CATHODE sputtering (Plating process), *THIN films, *MAGNETIC fields, *PLASMA generators, *PLASMA devices, *MAGNETRONS


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  19. 19
    Academic Journal
    Electrophysical properties of dielectric films in MDM-structures.

    المؤلفون: Danilina, T. I.1, Troyan, P. E.1 tpe@ms.tusur.ru

    المصدر: Russian Physics Journal. Apr2010, Vol. 53 Issue 4, p331-335. 5p. 1 Chart, 3 Graphs.

    مصطلحات موضوعية: *CATHODE sputtering (Plating process), *DIELECTRIC films, *ELECTRIC discharges, *SILICA, *NITRIDES


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  20. 20
    Academic Journal
    Growth of porous anodic films on sputtering-deposited aluminium incorporating Al–Hf alloy nanolayers

    المؤلفون: Garcia-Vergara, S.J.1, Hashimoto, T.1, Skeldon, P.1 p.skeldon@manchester.ac.uk, Thompson, G.E.1, Habazaki, H.2

    المصدر: Electrochimica Acta. May2009, Vol. 54 Issue 13, p3662-3670. 9p.

    مصطلحات موضوعية: *CATHODE sputtering (Plating process), *POROUS materials, *SCANNING electron microscopy, *THIN films, *ANODES, *ALUMINUM alloys, *HAFNIUM compounds, *ELECTROLYTES


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