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1Academic Journal
المؤلفون: Hiroaki Aoyama, Hitoe Habuchi, Kazushi Yasuda, Ryosuke Kobayashi, 安田 和史, 小林 涼介, 羽渕 仁恵, 青山 宏明
المصدر: JSAP Annual Meetings Extended Abstracts. 2019, :1261
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2Academic Journal
المؤلفون: Bourquard, Florent, Maddi, Chiranjeevi, Donnet, Christophe, Loir, Anne-Sophie, Barnier, Vincent, Wolski, Krzysztof, Garrelie, Florence
المساهمون: Laboratoire Hubert Curien (LabHC), Institut d'Optique Graduate School (IOGS)-Université Jean Monnet - Saint-Étienne (UJM)-Centre National de la Recherche Scientifique (CNRS), Université de Lyon, Département Mécanique physique et interfaces (MPI-ENSMSE), École des Mines de Saint-Étienne (Mines Saint-Étienne MSE), Institut Mines-Télécom Paris (IMT)-Institut Mines-Télécom Paris (IMT)-SMS, Centre Science des Matériaux et des Structures (SMS-ENSMSE), Institut Mines-Télécom Paris (IMT)-Institut Mines-Télécom Paris (IMT), Laboratoire Georges Friedel (LGF-ENSMSE), Institut Mines-Télécom Paris (IMT)-Institut Mines-Télécom Paris (IMT)-Université de Lyon-Centre National de la Recherche Scientifique (CNRS)
المصدر: ISSN: 0169-4332.
مصطلحات موضوعية: PLUME, GRAPHITE, ABLATION, CARBON-FILMS, OPTICAL-EMISSION SPECTROSCOPY, Ultrafast laser, Carbon nitride films, Plasma, PRESSURE, NITRIDE, TARGETS, GROWTH, [SPI.MAT]Engineering Sciences [physics]/Materials, [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic
Relation: emse-01495219; https://hal-emse.ccsd.cnrs.fr/emse-01495219; https://hal-emse.ccsd.cnrs.fr/emse-01495219/document; https://hal-emse.ccsd.cnrs.fr/emse-01495219/file/bourquard2016.pdf
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3
المؤلفون: Jaakko Julin, K. Petrikowski, M. Fenker, A. Richter
المصدر: Vacuum 162(2019), 8-14
مصطلحات موضوعية: Materials science, PACVD, Analytical chemistry, carbon films, chemistry.chemical_element, XRR, 02 engineering and technology, Substrate (electronics), Chemical vapor deposition, 01 natural sciences, Electrical resistance and conductance, 0103 physical sciences, Total pressure, Instrumentation, 010302 applied physics, electrical conductivity, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Nitrogen, Surfaces, Coatings and Films, Elastic recoil detection, X-ray reflectivity, Amorphous carbon, chemistry, carbon nitride films, DLC, 0210 nano-technology
وصف الملف: application/pdf
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4Academic Journal
المؤلفون: Galeano-Osorio, Diana Shirley, Vargas, Santiago, Ospina-Ospina, Rogelio, Restrepo-Para, Elisabeth, Arango, Pedro Jose
المصدر: DYNA; Vol. 81 Núm. 186 (2014); 94-101 ; DYNA; Vol. 81 No. 186 (2014); 94-101 ; 2346-2183 ; 0012-7353
مصطلحات موضوعية: Carbon nitride films, Raman spectroscopy, FTIR spectroscopy, substrate temperature, Películas de nitruro de carbono, Espectroscopía Raman, Espectroscopía FTIR, Temperatura del sustrato
وصف الملف: application/pdf; text/html
Relation: https://revistas.unal.edu.co/index.php/dyna/article/view/39121/pdf_v81n186a12; https://revistas.unal.edu.co/index.php/dyna/article/view/39121/53879; Ruden, A., González Carmona, J.M., Restrepo, J.S., Cano, M.F. and Sequeda, F., Tribología de recubrimientos de ZrN, CrN y TiAlN obtenidos por magnetron sputtering reactivo, DYNA, 80 (178), pp. 95-100, 2013.; Muñoz, J.E. and Coronado J.J. Análisis mecánico y tribológico de los recubrimientos Fe-Cr-Ni-C y Ni-Al-Mo, DYNA, 74 (153), pp. 111-118, 2007.; Copete H., López, E., Vargas Galvis F., Echavarría A. and Ríos T., Evaluación del comportamiento in vitro de recubrimientos de hidroxiapatita depositados mediante proyección térmica por combustión oxiacetilénica sobre un sustrato de Ti6Al4V, DYNA 80 (177), 101-107, 2013.; Liu, A.Y. and Cohen, M.L., Prediction of new low compressibility solids, Science, 245 (4920), pp. 841-842, 1989. DOI:10.1126/science.245.4920.841; Wei, S., Shao, T. and Ding, P., Study of CNx films on 316L stainless steel for orthodontic application, Diamond. and Related Materials, 19 (5-6), pp. 648-653, 2010.; Cappelli, E., Trucchi, D.M, Kaciulis, S., Orlando S., Zanza, A. and Mezzi A., Effect of deposition temperature on chemical composition and electronic properties of amorphous carbon nitride (a-CNx) thin films grown by plasma assisted pulsed laser deposition, Thin Solid Films, 519, pp. 4059-4063, 2011.; Zhang, K., Wen, M., Meng, Q.N., Zeng, Y., Hu C.Q., Liu C. and Zheng W.T., Structure, mechanical property, and tribological behavior of c-NbN/CNx multilayers grown by magnetron sputtering, Surface and Coatings Technology, 206, pp. 4040-4045, 2012.; Mishra, S.K., Shekhar, Ch. and Rupa, P.K.P. and Pathak, L.C., Effect of pressure and substrate temperature on the deposition of nano-structured silicon-carbon-nitride superhard coatings by magnetron sputtering, Thin Solid Films, 515, pp. 4738-4744, 2007.; Hsieh, W.-J., Shih, P.-S., Lin, Ch.-Ch., Wang, Ch.-Y. and Shih H.C., Structure and optical property of the a-C:N films synthesized by filtered cathode vacuum arc, Surface Coating Technology, 200, pp. 3175-3178, 2006.; Hakovirta, M., Salo, J., Lappalainen, R. and Antitila A., Correlation of carbon ion energy with sp2/sp3 ratio in amorphous diamond films produced with a mass-separated ion beam, Physics Letter A, 205 (49), pp. 287-289, 1995.; Fuge, G. M., Rennick, Ch.J., Pearce, S.R.J., May, P.W., Ashfold, M.N.R., Structural characterisation of CNx thin films deposited by pulsed laser ablation, Diamond Related Materials, 12, pp. 1049-1054, 2003.; Chen, Z.Y., Zhao, J.P., Yano T., Ooie, T., and Sakakibara, M.J., Effect of temperature on carbon nitride films synthesized by ion-beam-assisted pulsed laser deposition, Journal of Applied Physics, 88, pp. 7060-7066, 2000.; Zhou Z., Xia L. and Sun M., Carbon nitride films prepared at various substrate temperatures by vacuum cathodic arc method, Diamond Related Material, 13 (1). pp. 14-21, 2004.; Zhou Z., Xia L., Sun M., The investigation of carbon nitride films deposited at various substrate temperatures and N2/Ar flow ratios by vacuum cathodic arc method, Applied Surface Science, vol. 222 (14-), pp. 327-337, 2004.; Lejeune, M., Durand-Drouhin, O., Charvet, S., Zeinert, A. and Benlahsen, M., On the induced microstructure changes of the amorphous carbon nitride films during annealing, Journal of Applied Physics, 101 (12), pp. 123501, 2007.; Ospina R., Castillo, H.A., Benavides, V., Restrepo, E., Arango, Y.C., Arias, D.F. and Devia, A., Influence of the annealing temperature on a crystal phase of W/WC bilayers grown by pulsed arc discharge, Vacuum, 81 (3), pp. 373-377, 2006.; Ospina R., Escobar D., Restrepo-Parra, E. Arango, P.J. and Jurado, J.F., Substrate temperature influence on W/WCNx bilayers grown by pulsed vacuum arc discharge, Applied Surface Science, 258 (12), pp. 5100-5104, 2012.; Chalmers, J.M., Griffiths, P.R., Eds. Handbook of vibrational spectroscopy, Vol. 1, Theory and Instrumentation, John Wiley & Sons, Inc., 2003; Lejeune, M., Charvet, S., Zeinert, A. and Benlahsen, M., Optical behavior of reactive sputtered carbon nitride films during annealing, Journal Applied Physics, 103 (1), pp. 013507, 2008.; Bouchet-Fabre B., Marino, E., Lazar, G., Zellama, K., Clin, M., Ballutaud, D., Abel, F. and Godet C., Spectroscopic study using FTIR, Raman, XPS and NEXAFS of carbon nitride thin films deposited by RF magnetron sputtering, Thin Solid Films, 482 (1-2), pp. 167-171, 2005.; Segura-Giraldo, B., Restrepo-Parra, E. and Arango-Arango P.J., On the influence of a TiN interlayer on DLC coatings produced by pulsed vacuum arc discharge: Compositional and morphological study, Applied Surface Science, vol. 256 (1), pp. 136-141, 2009.; Bouchet-Fabre, B., Fernandez, V., Gohier, A., Parent, P., Laffon, C., Angleraud, B., Tessier, P.Y. and Minea, T.M., Temperature effect on the nitrogen insertion in carbon nitride films deposited by ECR, Diamond Related Materials, 18 (9), pp. 1091-1097, 2009.; Hammer, P., Baker, M.A., Lenardi, C. and Gissler, W., Synthesis of carbon nitride films at low temperatures, Journal of Vacuum Science Technology A, 15 (1), pp. 107-112, 1997.; Zhao, X.-A., Ong, C.W., Tsang, Y.C., Chan, K.F., Choy, C., Chan, P.W. and Kwok, R.W.M., Relationship between the structure and the optical and electrical properties of ion beam deposited CNx films, Thin Solid Films, 322 81-2), pp. 245-253, 1998.; Zhang J., Liu, W., Li, X., Zhan, B., Cui, Q. and Zou, G., Well-crystallized nitrogen-rich graphitic carbon nitride nanocrystallites prepared via solvothermal route at low temperature, Materials Research Bulleting, 44, pp. 294, 2009.; Li, Z., Zhou, J., Zhang, J., Chen, T. and Yuan, J., Carbon nitrides synthesized by glow discharge method, Journal of Alloys and Compounds, 346 (1-2), pp. 230-234, 2002.; Lazar, G., Clin, M., Charvet, S., Therasse, M., Godet, C. and Zellama, K., Effect of the RF power and deposition temperature on the electrical and vibrational properties of carbon nitride films, Diamond Related Materials, 12 (2), pp. 201-207, 2003.; Majumdar, A., Schäfer, J., Mishra, P., Ghose, D., Meichsner J., and Hippler R., Chemical composition and bond structure of carbon-nitride films deposited by CH4/N2 dielectric barrier discharge, Surface and Coatings Technology, 201, pp. 6437-6444, 2007.; Kovács, G., Veres, M., Koós, M. and Radnóczi, G. Raman spectroscopic study of magnetron sputtered carbon-nickel and carbon nitride-nickel composite films: the effect of nickel on the atomic structure of the C/CNx matrix, Thin Solid Films, 516, pp. 7910-7915, 2008.; Wang, J., Huang, N., Pan, C.J., Kwok, S.C.H., Yang, P., Leng, Y.X., Chen, J.Y., Sun, H., Wan, G.J., Liu, Z.Y. and Chu, P.K., Bacterial repellence from polyethylene terephthalate surface modified by acetylene plasma immersion ion implantation-deposition, Surface and Coatings Technology, 186 (1-2), pp. 299-304, 2004.; Cappelli, E., Scilletta, C., Orlando, S., Valentini, V. and Servidori, M., Laser annealing of amorphous carbon films, Applied Surface Science, 255, pp. 5620-5625, 2009.; Marcinauskas, L., Grigonis, A., Valatkevicius, P. and Medvid, A. Irradiation of the graphite-like carbon films by ns-laser pulse, Applied Surface Science, 261, pp. 488-492, 2012.; Colthup, N.B., Daly, L.H. and Wiberly, S.E., Introduction to infrared and raman spectroscopy, 3rd Ed., Academic Press, New York, 1990.; Chowdhury, A., Cameron, D. and Hashmi, M., Vibrational properties of carbon nitride films by Raman spectroscopy, Thin Solid Films, 332 (1-2), pp. 62-68, 1998.; Wang, X., Li, Z., Wu, P., Jiang, E. and Bai, H., Annealing effects on the microstructure of amorphous carbon nitride films, Applied Surface Science, 253 (4), pp. 2087-2092, 2006.; Sebald, T., Kaltofen, R. and Weise, G. Reactively r.f. magnetron sputtered carbon nitride films, Surface and Coatings Technology, 98 (1-3), pp. 1280-1285, 1998.; McCulloch, D., Prawer, S. and Hoffman, A., Structural investigation of xenon-ion-beam-irradiated glassy carbon, Physical Review B, 50, pp. 5905-5917, 1994.; Khun, N.W. and Liu, E., Effect of substrate temperature on corrosion performance of nitrogen doped amorphous carbon thin films in NaCl solution, Thin Solid Films, 517 (17), pp. 4762-4767, 2009.; Zemek, J., M. Jelinek, M., Vorlicek, V., Trchova, M., Lancok, J., Carbon nitride layers created by laser deposition combined with RF discharge, Diamond and Related Materials, vol. 9 (3), pp. 548-551, 2000.; Stanishevsky, A., On the surface morphology of C:N films deposited by pulsed cathodic arc discharge method, Materials Letter, 37 (3), pp. 162-167, 1998.; Huang, Z., Yang, B., Liu, C., Guo, L., Fan, X. and Fu, D., Effect of annealing on the composition, structure and mechanical properties of carbon nitride films deposited by middle-frequency magnetron sputtering, Materials Letter, 61 (3), pp. 3443-3445, 2007.; Galeano-Osorio, D.S., Vargas, S., López-Córdoba, L.M., Ospina, R., Restrepo-Parra, E., Arango, P.J., Substrate temperature influence on the trombogenicity in amorphous carbon nitride thin coatings, Applied Surface Science, 256 (24), pp. 7484, 2010.; Zhao, M.L., Li D.J., Guo, M.X., Zhang, Y.T., Gu, H.Q., Deng, X.Y., Wan, R.X., Sun, X., The different N concentrations induced cytocompatibility and hemocompatibility of MWCNTs with CNx coatings, Surface and Coatings Technology, 229, pp. 90-96, 2013.; https://revistas.unal.edu.co/index.php/dyna/article/view/39121
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5Academic Journal
المؤلفون: Galeano-Osorio, Diana Shirley, Vargas, Santiago, Ospina-Ospina, Rogelio, Restrepo-Para, Elisabeth, Arango, Pedro José
مصطلحات موضوعية: Carbon nitride films, Raman spectroscopy, FTIR spectroscopy, substrate temperature
وصف الملف: application/pdf; application/msword
Relation: http://revistas.unal.edu.co/index.php/dyna/article/view/39121; Universidad Nacional de Colombia Revistas electrónicas UN Dyna; Dyna; Dyna; Vol. 81, núm. 186 (2014); 94-101 DYNA; Vol. 81, núm. 186 (2014); 94-101 2346-2183 0012-7353; Galeano-Osorio, Diana Shirley and Vargas, Santiago and Ospina-Ospina, Rogelio and Restrepo-Para, Elisabeth and Arango, Pedro José (2014) Carbon nitride films grown by cathodic vacuum arc for hemocompatibility applications. Dyna; Vol. 81, núm. 186 (2014); 94-101 DYNA; Vol. 81, núm. 186 (2014); 94-101 2346-2183 0012-7353 .; https://repositorio.unal.edu.co/handle/unal/48933; http://bdigital.unal.edu.co/42390/
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6
المؤلفون: Henri N. Migeon, M. Belmahi, Virginie Hody, Badreddine Assouar, Valerie Brien, Paul Kouakou, Jamal Bougdira
المساهمون: Laboratoire de physique des milieux ionisés et applications (LPMIA), Université Henri Poincaré - Nancy 1 (UHP)-Centre National de la Recherche Scientifique (CNRS), Centre de Recherche Public - Gabriel Lippmann (LUXEMBOURG)
المصدر: Plasma Processes and Polymers
Plasma Processes and Polymers, Wiley-VCH Verlag, 2007, 4 (S1), pp.S210-S214. ⟨10.1002/ppap.200730703⟩مصطلحات موضوعية: Materials science, Polymers and Plastics, Microwave Plasma Assisted Chemical Vapor Deposition (MPACVD), Scanning electron microscope, Analytical chemistry, FOS: Physical sciences, 02 engineering and technology, Chemical vapor deposition, Applied Physics (physics.app-ph), [CHIM.INOR]Chemical Sciences/Inorganic chemistry, 01 natural sciences, Optical Emission Spectroscopy (OES), chemistry.chemical_compound, 0103 physical sciences, Scanning Electron Microscopy (SEM), Thin film, Carbon nitride, Transmission Electron Microscopy (TEM), 010302 applied physics, Condensed Matter - Materials Science, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Materials Science (cond-mat.mtrl-sci), Physics - Applied Physics, [CHIM.MATE]Chemical Sciences/Material chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Nanocrystalline material, Carbon film, chemistry, Electron diffraction, Transmission electron microscopy, carbon nitride films, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], 0210 nano-technology
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7
المؤلفون: Flores-Ruiz, F. J., Tucker, Mark, Bakoglidis, Konstantinos, Yu, X., Gellman, A. J., Herrera-Gomez, A., Hultman, Lars, Rosén, Johanna, Broitman, Esteban, 1958
المصدر: Tribology International. 128:104-112
مصطلحات موضوعية: Fullerene-like films, Microtribology, Carbon-nitride films, Carbon films
وصف الملف: print
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8Academic Journal
المؤلفون: Kouakou, Paul, Brien, Valerie, Assouar, Badreddine, Hody, Virginie, Belmahi, Mohammed, Migeon, Henri, N, Bougdira, Jamal
المساهمون: Laboratoire de physique des milieux ionisés et applications (LPMIA), Université Henri Poincaré - Nancy 1 (UHP)-Centre National de la Recherche Scientifique (CNRS), Centre de Recherche Public - Gabriel Lippmann (LUXEMBOURG)
المصدر: ISSN: 1612-8850.
مصطلحات موضوعية: carbon nitride films, Microwave Plasma Assisted Chemical Vapor Deposition (MPACVD), Optical Emission Spectroscopy (OES), Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], [CHIM.INOR]Chemical Sciences/Inorganic chemistry, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], [CHIM.MATE]Chemical Sciences/Material chemistry
Relation: info:eu-repo/semantics/altIdentifier/arxiv/2109.04777; hal-02900049; https://hal.science/hal-02900049; https://hal.science/hal-02900049/document; https://hal.science/hal-02900049/file/Kouakou_post_print.pdf; ARXIV: 2109.04777
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9Academic Journal
المؤلفون: Bongiorno, G, Blomqvist, M, Piseri, P, Milani, P, Lenardi, C, Ducati, C, Caruso, T, Rudolf, P, Wachtmeister, S, Csillag, S, Coronel, E
المصدر: Bongiorno , G , Blomqvist , M , Piseri , P , Milani , P , Lenardi , C , Ducati , C , Caruso , T , Rudolf , P , Wachtmeister , S , Csillag , S & Coronel , E 2005 , ' Nanostructured CNx (0
مصطلحات موضوعية: C. electron energy loss spectroscopy, electron microscopy, X-ray photoelectron spectroscopy, D. electronic structure, chemical structure, CARBON NITRIDE FILMS, GENERATING PARTICLE BEAMS, FULLERENE-LIKE STRUCTURES, ENERGY-LOSS SPECTROSCOPY, THIN SOLID FILMS, CONTROLLED DIMENSIONS, ELECTRON-MICROSCOPY, AERODYNAMIC LENSES, NOZZLE EXPANSIONS, NANOTUBES
وصف الملف: application/pdf
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10Academic Journal
المؤلفون: Haruhiko Ito, Nobuyoshi Mogi, 伊藤 治彦, 茂木 紳令
المصدر: JSAP Annual Meetings Extended Abstracts. 2015, :1218
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11Academic Journal
المؤلفون: M. Balaceanu, E. Grigore, G. Pavelescua, F. Ionescub, J. P. Rogerc
المساهمون: The Pennsylvania State University CiteSeerX Archives
مصطلحات موضوعية: Carbon nitride films, Hollow cathode discharge, FTIR
وصف الملف: application/pdf
Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.527.9319; http://joam.inoe.ro/arhiva/pdf2_4/Balaceanu.pdf
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12Academic Journal
المؤلفون: Hirofumi Takikawa, Hitoe Habuchi, Shiori Fujita, Shunsaku Takagi, 滝川 浩史, 羽渕 仁恵, 藤田 詩織, 髙木 俊作
المصدر: JSAP Annual Meetings Extended Abstracts. 2015, :1267
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13Academic Journal
المؤلفون: Manabu Ueda, Motonori Tamura, Takashi Miyakawa, Tetsuo Tanaka, 上田 学, 宮川 隆, 田中 哲夫, 田村 元紀
المصدر: 日本金属学会誌 / Journal of the Japan Institute of Metals and Materials. 1994, 58(6):642
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14
المؤلفون: Santiago Vargas, Diana Shirley Galeano-Osorio, Elisabeth Restrepo-Parra, P.J. Arango, Rogelio Ospina-Ospina
المصدر: Dyna, Vol 81, Iss 186, Pp 94-101 (2014)
Repositorio UN
Universidad Nacional de Colombia
instacron:Universidad Nacional de Colombiaمصطلحات موضوعية: lcsh:TN1-997, Materials science, lcsh:T, General Engineering, Analytical chemistry, Infrared spectroscopy, Nitride, Glassy carbon, lcsh:Technology, substrate temperature, Amorphous solid, chemistry.chemical_compound, symbols.namesake, FTIR spectroscopy, Amorphous carbon, chemistry, Raman spectroscopy, symbols, Graphite, Carbon nitride, lcsh:Mining engineering. Metallurgy, Carbon nitride films
وصف الملف: application/pdf; application/msword
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15
المؤلفون: Florence Garrelie, Teresa C. Rojas, Carole Chaix, Florent Bourquard, Juan Carlos Sánchez-López, N. Zehani, Krzysztof Wolski, Nicole Jaffrezic-Renault, Mohamed Braiek, Chiranjeevi Maddi, Anne-Sophie Loir, Florence Lagarde, Philippe Fortgang, Vincent Barnier, C. Donnet, Teddy Tite
المساهمون: Université de Lyon, Laboratoire Hubert Curien [Saint Etienne] (LHC), Université Jean Monnet [Saint-Étienne] (UJM)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), Laboratoire Georges Friedel (LGF-ENSMSE), Université de Lyon-Centre National de la Recherche Scientifique (CNRS)-École des Mines de Saint-Étienne (Mines Saint-Étienne MSE), Institut Mines-Télécom [Paris] (IMT)-Institut Mines-Télécom [Paris] (IMT), Interfaces & biosensors - Interfaces & biocapteurs, Institut des Sciences Analytiques (ISA), Université Claude Bernard Lyon 1 (UCBL), Université de Lyon-Université de Lyon-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université Claude Bernard Lyon 1 (UCBL), Université de Lyon-Université de Lyon-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Instituto de Ciencia de Materiales de Sevilla (ICMSE), Universidad de Sevilla-Consejo Superior de Investigaciones Científicas [Madrid] (CSIC), Agence Nationale de la Recherche (France)
المصدر: Diamond and Related Materials
Diamond and Related Materials, Elsevier, 2016, DIAMOND AND RELATED MATERIALS, 65, pp.17-25. ⟨10.1016/j.diamond.2016.01.001⟩
Digital.CSIC. Repositorio Institucional del CSIC
instnameمصطلحات موضوعية: Materials science, CARBON NITRIDE FILMS, Carbon nitride, ELECTRODES, Analytical chemistry, Pulsed laser deposition, 02 engineering and technology, 010402 general chemistry, 01 natural sciences, [SPI.MAT]Engineering Sciences [physics]/Materials, chemistry.chemical_compound, THIN-FILMS, SUBSTRATE, [CHIM.ANAL]Chemical Sciences/Analytical chemistry, Materials Chemistry, Electrochemistry, Electrical and Electronic Engineering, Thin film, High-resolution transmission electron microscopy, Functionalization, X-RAY PHOTOELECTRON, TEMPERATURE, COATINGS, Mechanical Engineering, General Chemistry, 021001 nanoscience & nanotechnology, Carbon nitrides, 0104 chemical sciences, Electronic, Optical and Magnetic Materials, Amorphous solid, Carbon film, chemistry, Amorphous carbon, 13. Climate action, CLICK CHEMISTRY, BONDING STRUCTURE, Cyclic voltammetry, 0210 nano-technology, FIELD-EMISSION
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16Academic Journal
المؤلفون: Maddi, C., Bourquard, Florent, Tite, T, Loir, A.-S., Donnet, C., Garrelie, Florence, Barnier, Vincent, Wolski, Krzysztof, Fortgang, Philippe, Zehani, Nedjla, Braiek, Mohamed, Lagarde, Florence, Carole, Chaix, Jaffrezic-Renault, Nicole, Rojas, Teresa-Cristina, Sanchez-Lopez, Juan Carlos
المساهمون: Université de Lyon, Laboratoire Hubert Curien (LabHC), Institut d'Optique Graduate School (IOGS)-Université Jean Monnet - Saint-Étienne (UJM)-Centre National de la Recherche Scientifique (CNRS), Laboratoire Georges Friedel (LGF-ENSMSE), École des Mines de Saint-Étienne (Mines Saint-Étienne MSE), Institut Mines-Télécom Paris (IMT)-Institut Mines-Télécom Paris (IMT)-Université de Lyon-Centre National de la Recherche Scientifique (CNRS), ISA-Interfaces & biosensors - Interfaces & biocapteurs, Institut des Sciences Analytiques (ISA), Université Claude Bernard Lyon 1 (UCBL), Université de Lyon-Université de Lyon-Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS)-Université Claude Bernard Lyon 1 (UCBL), Université de Lyon-Université de Lyon-Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS), Instituto de Ciencia de Materiales de Sevilla (ICMSE), Consejo Superior de Investigaciones Cientificas España = Spanish National Research Council Spain (CSIC)-Universidad de Sevilla = University of Seville
المصدر: ISSN: 0925-9635 ; Diamond and Related Materials ; https://hal.science/hal-01363692 ; Diamond and Related Materials, 2016, DIAMOND AND RELATED MATERIALS, 65, pp.17-25. ⟨10.1016/j.diamond.2016.01.001⟩.
مصطلحات موضوعية: ELECTRODES, TEMPERATURE, COATINGS, SUBSTRATE, Electrochemistry, Pulsed laser deposition, Carbon nitride, CARBON NITRIDE FILMS, X-RAY PHOTOELECTRON, THIN-FILMS, BONDING STRUCTURE, CLICK CHEMISTRY, FIELD-EMISSION, Functionalization, [CHIM.ANAL]Chemical Sciences/Analytical chemistry, [SPI.MAT]Engineering Sciences [physics]/Materials
Relation: hal-01363692; https://hal.science/hal-01363692
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17
المؤلفون: F. L. Freire, Gino Mariotto, M. M. Lacerda
المصدر: Diamond and Related Materials. 7:412-416
مصطلحات موضوعية: Carbon nitride films, rf-magnetron sputtering, Raman spectroscopy, rf-magnetron sputtering, Materials science, Annealing (metallurgy), Mechanical Engineering, Analytical chemistry, Dangling bond, General Chemistry, Sputter deposition, Atmospheric temperature range, Electronic, Optical and Magnetic Materials, Amorphous solid, chemistry.chemical_compound, symbols.namesake, Amorphous carbon, chemistry, Raman spectroscopy, Materials Chemistry, symbols, Electrical and Electronic Engineering, Carbon nitride, Carbon nitride films
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18
المؤلفون: Florence Garrelie, Chiranjeevi Maddi, Florent Bourquard, Vincent Barnier, Krzysztof Wolski, Christophe Donnet, Anne-Sophie Loir
المساهمون: Laboratoire Hubert Curien [Saint Etienne] (LHC), Institut d'Optique Graduate School (IOGS)-Université Jean Monnet [Saint-Étienne] (UJM)-Centre National de la Recherche Scientifique (CNRS), Université de Lyon, Département Mécanique physique et interfaces (MPI-ENSMSE), École des Mines de Saint-Étienne (Mines Saint-Étienne MSE), Institut Mines-Télécom [Paris] (IMT)-Institut Mines-Télécom [Paris] (IMT)-SMS, Centre Science des Matériaux et des Structures (SMS-ENSMSE), Institut Mines-Télécom [Paris] (IMT)-Institut Mines-Télécom [Paris] (IMT), Laboratoire Georges Friedel (LGF-ENSMSE), Institut Mines-Télécom [Paris] (IMT)-Institut Mines-Télécom [Paris] (IMT)-Centre National de la Recherche Scientifique (CNRS), ComUE LYON, Université de Lyon-Centre National de la Recherche Scientifique (CNRS)-École des Mines de Saint-Étienne (Mines Saint-Étienne MSE), Institut Mines-Télécom [Paris] (IMT)-Institut Mines-Télécom [Paris] (IMT)-Université de Lyon-Centre National de la Recherche Scientifique (CNRS)
المصدر: Applied Surface Science
Applied Surface Science, Elsevier, 2015, ⟨10.1016/j.apsusc.2015.10.039⟩
Applied Surface Science, Elsevier, 2016, 374, pp.104-111. ⟨10.1016/j.apsusc.2015.10.039⟩
HAL
Applied Surface Science, Elsevier, 2015, In pressمصطلحات موضوعية: Materials science, GRAPHITE, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Context (language use), Ultrafast laser, 02 engineering and technology, PRESSURE, 010402 general chemistry, 01 natural sciences, CARBON-FILMS, Pulsed laser deposition, [SPI.MAT]Engineering Sciences [physics]/Materials, Plasma, TARGETS, [PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph], OPTICAL-EMISSION SPECTROSCOPY, ABLATION, Deposition (phase transition), NITRIDE, Thin film, ComputingMilieux_MISCELLANEOUS, Carbon nitride films, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Surfaces and Interfaces, General Chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Nitrogen, 0104 chemical sciences, Surfaces, Coatings and Films, PLUME, Carbon film, Amorphous carbon, chemistry, 13. Climate action, [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], GROWTH, [PHYS.PHYS.PHYS-CHEM-PH]Physics [physics]/Physics [physics]/Chemical Physics [physics.chem-ph], 0210 nano-technology, Ambient pressure
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المؤلفون: Teresa-Cristina Rojas, Juan Carlos Sánchez-López, Teddy Tite, Chiranjeevi Maddi, Vincent Barnier, A.-S. Loir, Krzysztof Wolski, Christophe Donnet, Florence Garrelie
المساهمون: Laboratoire Hubert Curien [Saint Etienne] (LHC), Institut d'Optique Graduate School (IOGS)-Université Jean Monnet [Saint-Étienne] (UJM)-Centre National de la Recherche Scientifique (CNRS), Université de Lyon, Département Mécanique physique et interfaces (MPI-ENSMSE), École des Mines de Saint-Étienne (Mines Saint-Étienne MSE), Institut Mines-Télécom [Paris] (IMT)-Institut Mines-Télécom [Paris] (IMT)-SMS, Centre Science des Matériaux et des Structures (SMS-ENSMSE), Institut Mines-Télécom [Paris] (IMT)-Institut Mines-Télécom [Paris] (IMT), Laboratoire Georges Friedel (LGF-ENSMSE), Institut Mines-Télécom [Paris] (IMT)-Institut Mines-Télécom [Paris] (IMT)-Université de Lyon-Centre National de la Recherche Scientifique (CNRS), Instituto de Ciencia de Materiales de Sevilla (ICMSE), Universidad de Sevilla-Consejo Superior de Investigaciones Científicas [Madrid] (CSIC), Université Jean Monnet [Saint-Étienne] (UJM)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), Institut Mines-Télécom [Paris] (IMT)-Institut Mines-Télécom [Paris] (IMT)-Centre National de la Recherche Scientifique (CNRS)
المصدر: Applied Surface Science
Applied Surface Science, Elsevier, 2015, 332, pp.346-353. ⟨10.1016/j.apsusc.2015.01.123⟩
Digital.CSIC. Repositorio Institucional del CSIC
instname
idUS. Depósito de Investigación de la Universidad de Sevillaمصطلحات موضوعية: Materials science, EELS, CARBON NITRIDE FILMS, Carbon nitride, Analytical chemistry, General Physics and Astronomy, 02 engineering and technology, Nitride, MW Raman spectroscopy, 01 natural sciences, Pulsed laser deposition, [SPI.MAT]Engineering Sciences [physics]/Materials, chemistry.chemical_compound, symbols.namesake, THIN-FILMS, SUBSTRATE, X-ray photoelectron spectroscopy, AMORPHOUS-CARBON, 0103 physical sciences, XPS, RAMAN-SPECTRA, Thin film, 010302 applied physics, TRIBOLOGICAL CHARACTERIZATION, DIAMOND-LIKE CARBON, PULSED-LASER DEPOSITION, Surfaces and Interfaces, General Chemistry, [CHIM.MATE]Chemical Sciences/Material chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Surfaces, Coatings and Films, Femtosecond laser, Carbon film, Amorphous carbon, chemistry, symbols, BONDING STRUCTURE, Plasma assistance, PLD, 0210 nano-technology, Raman spectroscopy, FIELD-EMISSION
وصف الملف: application/pdf
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المؤلفون: Paolo Piseri, Ernesto Coronel, M Blomqvist, Stefan Csillag, Petra Rudolf, Cristina Lenardi, T. Caruso, S Wachtmeister, Caterina Ducati, Paolo Milani, G. Bongiorno
المساهمون: Surfaces and Thin Films, Zernike Institute for Advanced Materials
المصدر: Carbon, 43(7), 1460-1469. PERGAMON-ELSEVIER SCIENCE LTD
مصطلحات موضوعية: X-ray photoelectron spectroscopy, Nanostructure, Materials science, CARBON NITRIDE FILMS, Analytical chemistry, NANOTUBES, Electron, D. electronic structure, law.invention, law, Deposition (phase transition), General Materials Science, Thin film, ELECTRON-MICROSCOPY, AERODYNAMIC LENSES, THIN SOLID FILMS, electron microscopy, FULLERENE-LIKE STRUCTURES, General Chemistry, C. electron energy loss spectroscopy, ENERGY-LOSS SPECTROSCOPY, NOZZLE EXPANSIONS, Transmission electron microscopy, CONTROLLED DIMENSIONS, GENERATING PARTICLE BEAMS, chemical structure, Electron microscope, Beam (structure)
وصف الملف: application/pdf