المؤلفون: Jerome Knappett, Blair Haydon, Bruce CC Cowie, Cameron Kewish, Grant van Riessen

مصطلحات موضوعية: Physical chemistry, Physical sciences, Atomic, molecular and optical physics, Condensed matter physics, extreme ultraviolet lithography, interference lithography, soft X-ray lithography, synchrotron beamline, wavefront propagation

Relation: https://figshare.com/articles/journal_contribution/Evaluation_of_the_X-ray_EUV_Nanolithography_Facility_at_AS_through_wavefront_propagation_simulations/25930387

الاتاحة: https://doi.org/10.26181/25930387.v1
https://figshare.com/articles/journal_contribution/Evaluation_of_the_X-ray_EUV_Nanolithography_Facility_at_AS_through_wavefront_propagation_simulations/25930387

المؤلفون: Qiran Cai, Aijun Du, Guoping Gao, Srikanth Mateti, Bruce CC Cowie, Dong Qian, Shuang Zhang, Yuerui Lu, Lan Fu, Takashi Taniguchi, Shaoming Huang, Ying, Rodney S Ruoff, Lu Hua Li

مصطلحات موضوعية: Uncategorised value

Relation: http://hdl.handle.net/10536/DRO/DU:30167803; https://figshare.com/articles/journal_contribution/2D_Nanomaterials_Molecule_Induced_Conformational_Change_in_Boron_Nitride_Nanosheets_with_Enhanced_Surface_Adsorption_Adv_Funct_Mater_45_2016_/20603079

الاتاحة: http://hdl.handle.net/10536/DRO/DU:30167803
https://figshare.com/articles/journal_contribution/2D_Nanomaterials_Molecule_Induced_Conformational_Change_in_Boron_Nitride_Nanosheets_with_Enhanced_Surface_Adsorption_Adv_Funct_Mater_45_2016_/20603079