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1Conference
المؤلفون: Li, Si, Lu, Xinlin, Grannemann, Stephen, Sweat, Daniel, Brakensiek, Kelsey E., Lu, Pengtao, Lowes, Joyce A., Krishnamurthy, Vandana, Van Driessche, Veerle, Guerrero, Douglas
المساهمون: Guerrero, Douglas, Amblard, Gilles R.
المصدر: Advances in Patterning Materials and Processes XLI
الاتاحة: http://dx.doi.org/10.1117/12.3010887
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2ConferenceUnderstanding and improving performance of 14-nm HP EUV lithography via rational design of materials
المؤلفون: Li, Si, Sweat, Daniel, Lu, Xinlin, Brakensiek, Kelsey E., Lu, Pengtao, Lowes, Joyce A., Van Driessche, Veerle, Guerrero, Douglas J.
المساهمون: Guerrero, Douglas, Amblard, Gilles R.
المصدر: Advances in Patterning Materials and Processes XLI
الاتاحة: http://dx.doi.org/10.1117/12.3010498
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3Conference
المؤلفون: Liang, Yichen, Brakensiek, Kelsey E., Lowes, Joyce, Chacko, Andrea M., Zhang, Ruimeng, Van Driessche, Veerle, Lang, Xiaolong, Kasthuri, Jaishankar, Luo, Ming, Guerrero, Douglas J.
المساهمون: Guerrero, Douglas, Sanders, Daniel P.
المصدر: Advances in Patterning Materials and Processes XXXIX
الاتاحة: http://dx.doi.org/10.1117/12.2610985
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4Periodical
المؤلفون: Sanders, Daniel P., Guerrero, Douglas, Liang, Yichen, Brakensiek, Kelsey E., Lowes, Joyce, Chacko, Andrea M., Zhang, Ruimeng, Van Driessche, Veerle, Lang, Xiaolong, Kasthuri, Jaishankar, Luo, Ming, Guerrero, Douglas J.
المصدر: Proceedings of SPIE; July 2022, Vol. 12055 Issue: 1 p120550A-120550A-9, 1084960p
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5Academic Journal
المؤلفون: Brakensiek, Kelsey E.
المصدر: Undergraduate Research Conference at Missouri S&T
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6Conference
المؤلفون: Liang, Yichen, Brakensiek, Kelsey E., Lowes, Joyce, Chacko, Andrea M., Zhang, Ruimeng, Van Driessche, Veerle, Lang, Xiaolong, Kasthuri, Jaishankar, Luo, Ming, Guerrero, Douglas J.
المصدر: Proceedings of SPIE; 1/22/2022, Vol. 12055, p120550A-120550A-9, 1p