المؤلفون: Zhang, J., Denning, D., Braeckelmann, G., Venkatraman, R., Fiordalice, R., Weitzman, E.

المصدر: Proceedings of the IEEE 1998 International Interconnect Technology Conference (Cat. No.98EX102) ; page 163-165

الاتاحة: http://dx.doi.org/10.1109/iitc.1998.704780
http://xplorestaging.ieee.org/ielx4/5680/15206/00704780.pdf?arnumber=704780

المؤلفون: Braeckelmann, G., Venkatraman, R., Capasso, C., Herrick, M.

المصدر: Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407)

الاتاحة: http://dx.doi.org/10.1109/iitc.2000.854335
http://xplorestaging.ieee.org/ielx5/6889/18548/00854335.pdf?arnumber=854335

المؤلفون: Braeckelmann, G., Manger, D., Seo, S.C., Beasor, S., Nifsten, S., Kaloyeros, A.E.

المصدر: European Workshop Materials for Advanced Metallization, ; page 27-29

الاتاحة: http://dx.doi.org/10.1109/mam.1998.887500
http://xplorestaging.ieee.org/ielx5/4897/19178/00887500.pdf?arnumber=887500

المؤلفون: Humbert, A., Regnier, C., Braeckelmann, G., Basso, M.-T., Ferreira, P.

المصدر: Materials Science and Engineering: B ; volume 114-115, page 209-213 ; ISSN 0921-5107

الاتاحة: http://dx.doi.org/10.1016/j.mseb.2004.07.079
https://api.elsevier.com/content/article/PII:S0921510704003071?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0921510704003071?httpAccept=text/plain

المؤلفون: Gonchond, J.-P., Wyon, C., Cacho, F., Braeckelmann, G., Rolland, G., Kwakman, L. F. Tz., Tsach, Y., Agnihotri, D. K., Formica, J. P.

المصدر: AIP Conference Proceedings; 2005, Vol. 788 Issue 1, p182-186, 5p

مصطلحات موضوعية: SILICIDES, THIN films, SEMICONDUCTORS, OPTICAL diffraction, NICKEL, PHYSICAL sciences

المؤلفون: Braeckelmann, G., Venkatraman, R., Capasso, C., Herrick, M.

المصدر: Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407); 2000, p236-238, 3p

المؤلفون: Zhang, J., Denning, D., Braeckelmann, G., Venkatraman, R., Fiordalice, R., Weitzman, E.

المصدر: Proceedings of the IEEE 1998 International Interconnect Technology Conference (Cat No98EX102); 1998, p163-165, 3p

المؤلفون: Denning, D., Braeckelmann, G., Zhang, J., Fiordalice, B., Venkatramen, R.

المصدر: 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat No98CH36216); 1998, p22-23, 2p