المؤلفون: Paul, Abhijeet, Tettamanzi, Giuseppe C., Lee, Sunhee, Mehrotra, Saumitra, Colleart, Nadine, Biesemans, Serge, Rogge, Sven, Klimeck, Gerhard

مصطلحات موضوعية: Condensed Matter - Mesoscale and Nanoscale Physics, Condensed Matter - Materials Science

URL الوصول: http://arxiv.org/abs/1102.0140

المؤلفون: Tettamanzi, Giuseppe Carlo, Paul, Abhijeet, Lee, Sunhee, Mehrotra, Saumitra R., Collaert, Nadine, Biesemans, Serge, Klimeck, Gerhard, Rogge, Sven

مصطلحات موضوعية: Condensed Matter - Mesoscale and Nanoscale Physics, Condensed Matter - Materials Science

URL الوصول: http://arxiv.org/abs/1011.2582

المؤلفون: Tettamanzi, Giuseppe C., Paul, Abhijeet, Lansbergen, Gabriel P., Verduijn, Jan, Lee, Sunhee, Collaert, Nadine, Biesemans, Serge, Klimeck, Gerhard, Rogge, Sven

المصدر: IEEE Electron Device Letters 21 (2010) 150

مصطلحات موضوعية: Condensed Matter - Mesoscale and Nanoscale Physics

URL الوصول: http://arxiv.org/abs/1003.5441

المؤلفون: Rosseel, Erik, Porret, Clement, Dursap, Thomas, Loo, Roger, Mertens, Hans, Ganguly, Jishnu, Sarkar, Ritam, Cavalcante, Camila, Richard, Olivier, Geypen, Jef, Marozas, Brendan, Casey, Daniel, Khazaka, Rami, Demuynck, Steven, P. B. Lima, Lucas, Langer, Robert, Biesemans, Serge, Horiguchi, Naoto

المصدر: ECS TRANSACTIONS ; ISSN: 1938-5862 ; ISSN: 1938-6737

مصطلحات موضوعية: Physics and Astronomy

وصف الملف: application/pdf

Relation: https://biblio.ugent.be/publication/01J93KKGAFD8HYXKXW0NE7TGVM; http://doi.org/10.1149/11402.0029ecst; https://biblio.ugent.be/publication/01J93KKGAFD8HYXKXW0NE7TGVM/file/01J93KSCQ41NHRB4GV50RWFT9G

الاتاحة: https://biblio.ugent.be/publication/01J93KKGAFD8HYXKXW0NE7TGVM
http://hdl.handle.net/1854/LU-01J93KKGAFD8HYXKXW0NE7TGVM
https://doi.org/10.1149/11402.0029ecst
https://biblio.ugent.be/publication/01J93KKGAFD8HYXKXW0NE7TGVM/file/01J93KSCQ41NHRB4GV50RWFT9G

المؤلفون: Gupta, Anshul, Tao, Zheng, Radisic, Dunja, Mertens, Hans, Pedreira, Olalla Varela, Demuynck, Steven, Boemmels, Juergen, Devriendt, Katia, Heylen, Nancy, Wang, Shouhua, Kenis, Karine, Teugels, Lieve, Sebaai, Farid, Lorant, Christophe, Jourdan, Nicolas, Chan, Boon Teik, Subramanian, Sujith, Schleicher, Filip, Peter, Antony, Rassoul, Nouredine, Siew, Yong Kong, Briggs, Basoene, Zhou, Dasiy, Rosseel, Erik, Capogreco, Elena, Mannaert, Geert, Sepúlveda Márquez, Alfonso, Dupuy, Emmanuel, Vandersmissen, Kevin, Chehab, Bilal, Murdoch, Gayle, Altamirano-Sánchez, Efrain, Biesemans, Serge, Tokei, Zsolt, Litta, Eugenio Dentoni, Horiguchi, Naoto

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XI

الاتاحة: http://dx.doi.org/10.1117/12.2615641

المؤلفون: Waldron, Niamh, Nguyen, Ngoc Duy, Lin, Dennis, Brammertz, Guy, Hellings, Geert, Vincent, Benjamin, Firrincieli, Andrea, Sioncke, Sonia, De Jaeger, Brice, Wang, Gang, Krom, Raymond, Mitard, Jérôme, Wang, Wei-E, Passlack, Matthias, Heyns, Marc, Caymax, Matty, Meuris, Marc, Biesemans, Serge, Hoffmann, Thomas

المصدر: urn:isbn:2151-2043
217th ECS Meeting (2010); 217th ECS Meeting, Vancouver, Canada [CA], 25-30/4/2010

مصطلحات موضوعية: III-V, CMOS, Device fabrication, Engineering, computing & technology, Electrical & electronics engineering, Ingénierie, informatique & technologie, Ingénierie électrique & électronique

URL الوصول: https://orbi.uliege.be/handle/2268/69096

المؤلفون: Dinh, Cong Que, Nagahara, Seiji, Shiraishi, Gousuke, Minekawa, Yukie, Kamei, Yuya, Carcasi, Michael, Ide, Hiroyuki, Kondo, Yoshihiro, Yoshida, Yuichi, Yoshihara, Kosuke, Shimada, Ryo, Tomono, Masaru, Moriya, Teruhiko, Takeshita, Kazuhiro, Nafus, Kathleen, Biesemans, Serge, Petersen, John S., De Simone, Danilo, Foubert, Philippe, De Bisschop, Peter, Vandenberghe, Geert, Stock, Hans-Jurgen, Meliorisz, Balint

المساهمون: Goldberg, Kenneth A.

المصدر: Extreme Ultraviolet (EUV) Lithography X

الاتاحة: http://dx.doi.org/10.1117/12.2515183

المؤلفون: Nagahara, Seiji, Dinh, Cong Que, Shiraishi, Gosuke, Kamei, Yuya, Nafus, Kathleen, Kondo, Yoshihiro, Carcasi, Michael A., Minekawa, Yukie, Ide, Hiroyuki, Yoshida, Yuichi, Yoshihara, Kosuke, Shimada, Ryo, Tomono, Masaru, Takeshita, Kazuhiro, Biesemans, Serge, Nakashima, Hideo, De Simone, Danilo, Petersen, John S., Foubert, Philippe, De Bisschop, Peter, Vandenberghe, Geert, Stock, Hans-Jürgen, Meliorisz, Balint

المساهمون: Gronheid, Roel, Sanders, Daniel P.

المصدر: Advances in Patterning Materials and Processes XXXVI

الاتاحة: http://dx.doi.org/10.1117/12.2515187

المؤلفون: Rio, David, Blanco Carballo, Victor M., Franke, Joern-Holger, Dusa, Mircea V., De Poortere, Etienne, Biesemans, Serge, Nafus, Kathleen, Gillijns, Werner, Hendrickx, Eric, van Adrichem, Paul, Lyakhova, Kateryna, Spence, Chris A.

المساهمون: Ronse, Kurt G., Gargini, Paolo A., Hendrickx, Eric, Naulleau, Patrick P., Itani, Toshiro

المصدر: International Conference on Extreme Ultraviolet Lithography 2018

الاتاحة: http://dx.doi.org/10.1117/12.2503321

المؤلفون: Alagna, Paolo, Biesemans, Serge, Nafus, Kathleen, Lorusso, Gian Francesco, Rechtsteiner, Gregory, Conley, Will

المساهمون: Kye, Jongwook, Owa, Soichi

المصدر: Optical Microlithography XXXI

الاتاحة: http://dx.doi.org/10.1117/12.2300511

المؤلفون: Blanco Carballo, Victor M., Bekaert, Joost, Mao, Ming, Kim, Ryoung-Han, Gillijns, Werner, McIntyre, Greg, Biesemans, Serge, Nafus, Kathleen, Dusa, Mircea, De Poortere, Etienne, Schiffelers, Guido, Kupers, Michiel, Franke, J. H., Hendrickx, E., Drissi, Y., Rio, D., Demand, M., Tan, L. E., Jia, J., Hsu, S.

المساهمون: Felix, Nelson M., Goldberg, Kenneth A.

المصدر: Extreme Ultraviolet (EUV) Lithography IX

الاتاحة: http://dx.doi.org/10.1117/12.2299639

المؤلفون: Carcasi, Michael, Nagai, Tomoki, Shima, Motoyuki, Kimura, Toru, Naruoka, Takehiko, Hori, Masafumi, Dei, Satoshi, Vandenberghe, Geert, Tagawa, Seiichi, Miyake, Masayuki, Nagahara, Seiji, Shiraishi, Gosuke, Minekawa, Yukie, Ide, Hiroyuki, Kondo, Yoshihiro, Yoshihara, Kosuke, Shimada, Ryo, Tomono, Masaru, Takeshita, Kazuhiro, Moriya, Teruhiko, Makoto, Hayakawa, Aizawa, Ryo, Konishi, Yoshitaka, Shiozawa, Takahiro, Nafus, Kathleen, Biesemans, Serge, Nakashima, Hideo, Nakagawa, Hisashi, De Simone, Danilo, Philippe, Foubert, Oshima, Akihiro

المساهمون: Hohle, Christoph K., Gronheid, Roel

المصدر: Advances in Patterning Materials and Processes XXXV

الاتاحة: http://dx.doi.org/10.1117/12.2297498

المؤلفون: Carcasi, Michael A., Nagahara, Seiji, Shiraishi, Gosuke, Minekawa, Yukie, Ide, Hiroyuki, Yoshihara, Kosuke, Tomono, Masaru, Shimada, Ryo, Vandenberghe, Geert, De Simone, Danilo, Foubert, Philippe, Oshima, Akihiro, Tagawa, Seiichi, Takeshita, Kazuhiro, Moriya, Teruhiko, Kamei, Yuya, Nafus, Kathleen, Biesemans, Serge, Nakashima, Hideo, Nakagawa, Hisashi, Naruoka, Takehiko, Nagai, Tomoki, Hori, Masafumi, Dei, Satoshi, Maruyama, Ken, Kondo, Yoshihiro, Miyake, Masayuki, Shima, Motoyuki, Petersen, John S.

المساهمون: Felix, Nelson M., Goldberg, Kenneth A.

المصدر: Extreme Ultraviolet (EUV) Lithography IX

الاتاحة: http://dx.doi.org/10.1117/12.2297370

المؤلفون: Bogdanowicz, Janusz, Saib, Mohamed, Beggiato, Matteo, Lorusso, Gian, Brissonneau, Vincent, Dupuy, Emmanuel, Loo, Roger, Shimura, Yosuke, Akula, Anjani, Arimura, Hiroaki, Puttarame Gowda, Pallavi, Chan, BT, Zhou, Daisy, Mertens, Hans, P. B. Lima, Lucas, Horiguchi, Naoto, Biesemans, Serge, Hung, Joey, Turovets, Igor, Wei, Sun

المصدر: ECS Meeting Abstracts; 2024, Vol. MA2024 Issue 2, p2302-2302, 1p