المؤلفون: Payne, B.R., Baird, J.L.

المصدر: Canadian Journal of Remote Sensing ; volume 2, issue 1, page 12-17 ; ISSN 0703-8992 1712-7971

الاتاحة: http://dx.doi.org/10.1080/07038992.1976.10854945
http://www.tandfonline.com/doi/pdf/10.1080/07038992.1976.10854945

المؤلفون: Lujan, R.D., Fleming, J.G., Baird, J.L., Gentry, M.S.

مصطلحات موضوعية: 36 MATERIALS SCIENCE, 42 ENGINEERING, MICROELECTRONIC CIRCUITS, FABRICATION, TUNGSTEN, CHEMICAL VAPOR DEPOSITION, CHEMICAL REACTORS, SURFACE CLEANING, MATERIALS HANDLING EQUIPMENT

وصف الملف: application/pdf

Relation: http://www.osti.gov/servlets/purl/10106589; https://www.osti.gov/biblio/10106589

الاتاحة: http://www.osti.gov/servlets/purl/10106589
https://www.osti.gov/biblio/10106589

المؤلفون: Glick, S.D., Carlson, J.N., Baird, J.L., Maisonneuve, I.M., Bullock, A.E.

المصدر: Brain Research ; volume 473, issue 1, page 161-164 ; ISSN 0006-8993

الاتاحة: http://dx.doi.org/10.1016/0006-8993(88)90329-0
https://api.elsevier.com/content/article/PII:0006899388903290?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:0006899388903290?httpAccept=text/plain

المؤلفون: Glick, S.D., Hinds, P.A., Baird, J.L.

المصدر: Brain Research ; volume 450, issue 1-2, page 334-341 ; ISSN 0006-8993

الاتاحة: http://dx.doi.org/10.1016/0006-8993(88)91572-7
https://api.elsevier.com/content/article/PII:0006899388915727?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:0006899388915727?httpAccept=text/plain