المؤلفون: Tommaso Jacopo Giammaria, Ahmed Gharbi, Anne Paquet, Paul Nealey, Raluca Tiron

المصدر: Nanomaterials, Vol 10, Iss 12, p 2443 (2020)

مصطلحات موضوعية: directed self-assembly (DSA), block copolymers (BCPs), chemo-epitaxy, polystyrene-block-polymethylmethacrylate (PS-b-PMMA), line/space patterning, line edge roughness (LER), Chemistry, QD1-999

وصف الملف: electronic resource

Relation: https://www.mdpi.com/2079-4991/10/12/2443; https://doaj.org/toc/2079-4991

URL الوصول: https://doaj.org/article/b01cfbd1a71b4d74a41c05c112f02888

المؤلفون: Raluca Tiron, Ahmed Gharbi, Tommaso Jacopo Giammaria, Anne Paquet, Paul F. Nealey

المصدر: Nanomaterials
Volume 10
Issue 12
Nanomaterials, Vol 10, Iss 2443, p 2443 (2020)

مصطلحات موضوعية: line edge roughness (LER), Materials science, business.industry, General Chemical Engineering, directed self-assembly (DSA), Surface finish, Epitaxy, line width roughness (LWR), Article, lcsh:Chemistry, lcsh:QD1-999, Resist, block copolymers (BCPs), polystyrene-block-polymethylmethacrylate (PS-b-PMMA), Optoelectronics, General Materials Science, Wafer, line/space patterning, Dry etching, Silicon oxide, business, Critical dimension, Lithography, chemo-epitaxy

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::20e106a39be78dd514f27e9407116215
http://europepmc.org/articles/PMC7762273