المؤلفون: Maximilian Lederer (11419304), Pratik Bagul (11419307), David Lehninger (11419310), Konstantin Mertens (11419313), André Reck (11419316), Ricardo Olivo (11419319), Thomas Kämpfe (1429363), Konrad Seidel (11419322), Lukas M. Eng (1427023)

مصطلحات موضوعية: Biophysics, Medicine, Evolutionary Biology, Ecology, Cancer, Inorganic Chemistry, Space Science, Chemical Sciences not elsewhere classified, Physical Sciences not elsewhere classified, hafnium oxide films, transmission kikuchi diffraction, observed stress relaxation, increasing annealing temperature, crystallization process due, crystallization process, annealing temperature, ray diffraction, strongly influenced, plane texture, mechanical stress, higher temperatures, findings reveal, ferroelectric properties, electrical properties, electrical characterization, crystallographic properties, capacitor structures

Relation: https://figshare.com/articles/journal_contribution/Influence_of_Annealing_Temperature_on_the_Structural_and_Electrical_Properties_of_Si-Doped_Ferroelectric_Hafnium_Oxide/16604402

الاتاحة: https://doi.org/10.1021/acsaelm.1c00590.s001