المؤلفون: Yoav Grauer, Andy Miller, Douglas Charles La Tulipe, Amnon Manassen, Shlomo Eisenbach, Ohad Bachar, Roel Gronheid

المصدر: Metrology, Inspection, and Process Control XXXVI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4c0056f08b162a6e558f07055ec32055
https://doi.org/10.1117/12.2608319

المؤلفون: Michael E. Adel, Mark D. Smith, Sangjun Han, Dongsub Choi, Myungjun Lee, Efi Megged, Anna Golotsvan, Joonseuk Lee, Tal Itzkovich, Amnon Manassen, Yuri Paskover, Victoria Naipak, Dohwa Lee, Tom Leviant, Honggoo Lee, Zephyr Liu, Vladimir Levinski, Mi-Rim Jung, Young-Sik Kim

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Computer science, business.industry, Process (computing), 02 engineering and technology, Overlay, 021001 nanoscience & nanotechnology, 01 natural sciences, Metrology, 010309 optics, Process variation, Optics, 0103 physical sciences, Process window, 0210 nano-technology, business, Lithography, Computer hardware

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::305ceb1659a85f9daa6b6d66fd9b6170
https://doi.org/10.1117/12.2258376