المؤلفون: Allen G. Timko, Allen H. Gabor, Andrew J. Blakeney, Arturo N. Medina, Elsa Reichmanis, Frank M. Houlihan, Gary Dabbagh, Gregory Spaziano, Ilya L. Rushkin, James R. Sweeney, John J. Biafore, Mark O. Neisser, Murrae J. Bowden, Ognian Dimov, Om Nalamasu, Patrick Foster, Ray A. Cirelli, Richard S. Hutton, Sydney G. Slater, Thomas Steinhäusler

المصدر: Journal of Photopolymer Science and Technology. 1999, 12(3):423

المؤلفون: ALLEN G. TIMKO, ELSA REICHMANIS, LARRY F. THOMPSON, MAY CHENG, OMKARAM NALAMASU, VICTOR POL

المصدر: Journal of Photopolymer Science and Technology. 1991, 4(3):299

المؤلفون: Guanyang Lin, Francis M. Houlihan, Simon Chiu, Muthiah Thiyqarqjan, Dougls Mackenzie, Andrew Romano, Clement Anyadiegwu, Takanori Kudo, Allen G. Timko, David Rentkiewicz, Dalil Rahman, Rqlph R. Dammel, Murirathna Padmanaban

المصدر: Journal of Photopolymer Science and Technology. 19:327-334

مصطلحات موضوعية: chemistry.chemical_classification, Materials science, Polymers and Plastics, Base (chemistry), Stereochemistry, Organic Chemistry, Extraction (chemistry), Analytical chemistry, Surface finish, Line width, Partition coefficient, Molar volume, Resist, chemistry, Materials Chemistry, Amine gas treating

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::edbbcff52030e2aee1ce0d14ca0295d8
https://doi.org/10.2494/photopolymer.19.327

المؤلفون: F. Klemens, Stanley Pau, Omkaram Nalamasu, G. P. Watson, Allen G. Timko, J. Frackoviak, Gregory Timp, R. Cirelli

المصدر: Microelectronic Engineering. 53:119-122

مصطلحات موضوعية: Multiple exposure, business.industry, Computer science, Process (computing), Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Light scattering, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Impression, Wavelength, Optics, Feature (computer vision), Electrical and Electronic Engineering, business, Lithography, Critical dimension

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ba5f7020006087ab5fb95b5eabdc8d2f
https://doi.org/10.1016/s0167-9317(00)00277-x

المؤلفون: M. Miller, R. Cirelli, D. Barr, R. Kohler, Y. T. Wang, J. Frackoviak, I. C. Kizilyalli, Omkaram Nalamasu, William M. Mansfield, G. P. Watson, J. Radosevich, Allen G. Timko, K. Bolan, R. Freyman, B. Pati, Frieder H. Baumann, H. Vaidya, F. Klemens

المصدر: Microelectronic Engineering. 53:101-104

مصطلحات موضوعية: Materials science, business.industry, Transistor, Hardware_PERFORMANCEANDRELIABILITY, Condensed Matter Physics, Chip, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Wavelength, law, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Phase-shift mask, Wafer, Electrical and Electronic Engineering, business, Lithography, Digital signal processing, Electronic circuit

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8d5a15db63b2ee571eb72606b550c5b6
https://doi.org/10.1016/s0167-9317(00)00273-2

المؤلفون: M. Miller, B. Pati, Isik C. Kizilyalli, Frieder H. Baumann, G. P. Watson, J. Frackoviak, H. Vaidya, R. Kohler, Omkaram Nalamasu, J. Bude, J. Radosevich, Y. T. Wang, R. Cirelli, D. Barr, F. Klemens, K. Bolan, R. Freyman, Allen G. Timko, William M. Mansfield

المصدر: Journal of Photopolymer Science and Technology. 13:485-491

مصطلحات موضوعية: Materials science, Polymers and Plastics, business.industry, Computational lithography, Extreme ultraviolet lithography, Organic Chemistry, Transistor, Hardware_PERFORMANCEANDRELIABILITY, Integrated circuit, law.invention, Optics, law, Hardware_INTEGRATEDCIRCUITS, Materials Chemistry, Optoelectronics, X-ray lithography, Photolithography, business, Lithography, Next-generation lithography, Hardware_LOGICDESIGN

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f0b6aee843cdb583bd3bce068df929a7
https://doi.org/10.2494/photopolymer.13.485

المؤلفون: Ilya L. Rushkin, Richard S. Hutton, Roderick R. Kunz, Arturo N. Medina, Allen G. Timko, Elsa Reichmanis, D. K. Downs, Sanjay Malik, M. Neiser, Omkaram Nalamasu, F. M. Houlihan, Allen H. Gabor

المصدر: Journal of Photopolymer Science and Technology. 12:525-535

مصطلحات موضوعية: chemistry.chemical_classification, Polymers and Plastics, Sulfonium, Aryl, Organic Chemistry, Salt (chemistry), Activation energy, Photochemistry, Outgassing, chemistry.chemical_compound, chemistry, Resist, Stearate, Materials Chemistry, Molecule

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f76476dfd92f747dec4232cfea2b0245
https://doi.org/10.2494/photopolymer.12.525

المؤلفون: Thomas Steinhausler, T. Sugihara, Janet M. Kometani, Andrew J. Blakeney, F. Van Roey, Sydney G. Slater, V. van Driessche, Plamen Tzviatkov, John J. Biafore, Anne-Marie Goethals, Allen G. Timko, R. Cirelli, Arturo N. Medina, F. M. Houlihan, Ingrid Pollers, Omkaram Nalamasu, Kurt G. Ronse, Allen H. Gabor

المصدر: Journal of Photopolymer Science and Technology. 11:513-523

مصطلحات موضوعية: Materials science, Polymers and Plastics, Proximity effect (electron beam lithography), business.industry, Organic Chemistry, Resolution (electron density), Process (computing), Linearity, Optics, Resist, Materials Chemistry, Dry etching, business, Lithography, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::24ad5d5bfa889bf60fc4e4de25790118
https://doi.org/10.2494/photopolymer.11.513

المؤلفون: Arturo N. Medina, Allen G. Timko, Janet M. Kometani, John J. Biafore, Sydney G. Slater, R. S. Hutton, Allen H. Gabor, F. M. Houlihan

المصدر: Journal of Photopolymer Science and Technology. 11:419-429

مصطلحات موضوعية: chemistry.chemical_compound, Materials science, Polymers and Plastics, Resist, chemistry, Organic Chemistry, Polymer chemistry, Materials Chemistry, Photochemistry, Single layer, Norbornene

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3b707325da2bdb0387defa132c4e093a
https://doi.org/10.2494/photopolymer.11.419

المؤلفون: Elsa Reichmanis, F. M. Houlihan, O. R. Wood, R. Cirelli, Anthony E. Novembre, Gary Dabbagh, Omkaram Nalamasu, Richard S. Hutton, D. A. Mixon, Thomas Ingolf Wallow, Allen G. Timko

المصدر: Microelectronic Engineering. 35:133-136

مصطلحات موضوعية: chemistry.chemical_classification, Materials science, Bilayer, Maleic anhydride, Nanotechnology, Polymer, Condensed Matter Physics, Silane, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Styrene, chemistry.chemical_compound, chemistry, Resist, Chemical engineering, Copolymer, Electrical and Electronic Engineering, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6dda46f2f6a80ab40812dafd1e74ebbe
https://doi.org/10.1016/s0167-9317(96)00172-4

المؤلفون: Richard S. Hutton, Elsa Reichmanis, Omkaram Nalamasu, Thomas Ingolf Wallow, Allen G. Timko, E. Neria, F. M. Houlihan, Janet M. Kometani, R. Cirelli

المصدر: Journal of Photopolymer Science and Technology. 10:511-520

مصطلحات موضوعية: chemistry.chemical_classification, Tetramethylammonium, Materials science, Polymers and Plastics, Organic Chemistry, Maleic anhydride, Polymer, chemistry.chemical_compound, chemistry, Resist, Chemical engineering, Materials Chemistry, Copolymer, Organic chemistry, Irradiation, Stepper, Dissolution

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f16392843083539096da06e8df1bfd36
https://doi.org/10.2494/photopolymer.10.511

المؤلفون: H. Holzwarth, G. Kaufel, Allen G. Timko, Hans-Thomas Schacht, P. Falcigno, C. Mertesdorf, N. Münzel, W. Bronner, Omkaram Nalamasu

المصدر: Microelectronic Engineering. 30:279-282

مصطلحات موضوعية: Post exposure, Materials science, Analytical chemistry, chemistry.chemical_element, Photoresist, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Ion, chemistry, Resist, Etching, Electrical and Electronic Engineering, Tin, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c58181107ab7f7423a3b45c30283ffd8
https://doi.org/10.1016/0167-9317(95)00245-6

المؤلفون: Omkaram Nalamasu, R. G. Tarascon, Allen G. Timko, Anthony E. Novembre, P. Falcigno, Sydney G. Slater, N. Münzel, H. Holzwarth, Elsa Reichmanis

المصدر: Microelectronic Engineering. 27:367-370

مصطلحات موضوعية: Materials science, Excimer laser, business.industry, Scanning electron microscope, medicine.medical_treatment, Condensed Matter Physics, Titanium nitride, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Laser linewidth, Optics, Silicon nitride, chemistry, Resist, medicine, Electrical and Electronic Engineering, Stepper, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fea7e9dc5f20a327c03c18da502bf906
https://doi.org/10.1016/0167-9317(94)00125-e

المؤلفون: C.P. Chang, W.Y.C. Lai, E.J. Lloyd, F.P. Klemens, K.P. Cheung, Philip W. Diodato, J. Frackoviak, M. Oh, R. Liu, J.F. Miner, Yi Ma, Hem M. Vaidya, Allen G. Timko, F. Li, J.R. Mcmacken, K.R. Stiles, J.I. Colonell, C.S. Pai, James T. Clemens, H.L. Maynard, C.T. Liu

المصدر: International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217).

مصطلحات موضوعية: chemistry.chemical_compound, Ion implantation, Materials science, CMOS, chemistry, Gate oxide, Rapid thermal processing, Analytical chemistry, Oxide, chemistry.chemical_element, System on a chip, Dual gate, Nitrogen

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5e8dafc03aaaee2dd94b48aa33cdbfb7
https://doi.org/10.1109/iedm.1998.746427

المؤلفون: J.T. Clemens, J. T. C. Lee, C. Gruensfelder, W.W. Tai, J. Frackoviak, W.Y.C. Lai, F.P. Klemens, Dale C. Jacobson, O. Nalamasu, H. Vaidya, C.S. Pai, William M. Mansfield, C.P. Chang, K. Bolan, Stephen C. Kuehne, R. Liu, M. Frei, H.L. Maynard, H.-H. Vuong, M.J. Thoma, K.P. Cheung, D.M. Boulin, Allen G. Timko, P. J. Silverman, C.T. Liu, Steven James Hillenius, J.I. Colonell, Joze Bevk, D. Monroe, R.W. Key, G.P. Watson, R. Santiesteban, Gerhard Hobler, M. Oh, Raymond A. Cirelli

المصدر: 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).

مصطلحات موضوعية: Very-large-scale integration, Materials science, Fabrication, Dopant, business.industry, Nanotechnology, Hardware_PERFORMANCEANDRELIABILITY, Threshold voltage, Ion implantation, CMOS, Gate oxide, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Hardware_ARITHMETICANDLOGICSTRUCTURES, Diffusion (business), business, Hardware_LOGICDESIGN

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fb6dd278f2675a7adc2617463a3c98c8
https://doi.org/10.1109/vlsit.1998.689205

المؤلفون: J. Rosamilia, Frieder H. Baumann, Rafael N. Kleiman, T. Boone, Sang Hyun Oh, Steven James Hillenius, J. P. Garno, J. Frackoviak, J.L. Grazul, K. Short, R. Cirelli, D. Barr, E. Ferry, N.A. Ciampa, James D. Plummer, K. Bolan, G. R. Weber, G.D. Wilk, M.R. Baker, R.W. Johnson, H.-J. Gossmann, John Michael Hergenrother, Conor S. Rafferty, Allen G. Timko, J.F. Miner, F. Klemens, Anthony T. Fiory, Avi Kornblit, Martin L. Green, D. J. Eaglesham, J.T.-C. Lee, M.D. Morris, Don Monroe, R.C. Keller, William M. Mansfield, T. Nigam, C. A. King, T.W. Sorsch

المصدر: International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).

مصطلحات موضوعية: Ion implantation, Materials science, business.industry, Gate oxide, Doping, MOSFET, Electrical engineering, Pillar, Optoelectronics, business, Key features

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e5583ced2fcd196f7c83cd127356bf15
https://doi.org/10.1109/iedm.2000.904260

المؤلفون: Allen G. Timko, K. Bolan, Lee Edward Trimble, James W. Blatchford, Omkaram Nalamasu, Pat G. Watson, J. Frackoviak, Stanley Pau, Raymond A. Cirelli

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Binary number, Integrated circuit, Photoresist, law.invention, Optics, law, Microelectronics, Phase-shift mask, X-ray lithography, Photomask, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9e3185e3c47d7d27052538e3be0f0297
https://doi.org/10.1117/12.389015

المؤلفون: Sanjay Malik, Allen H. Gabor, Arturo N. Medina, Ilya L. Rushkin, D. K. Downs, Omkaram Nalamasu, Richard S. Hutton, M. Neiser, Roderick R. Kunz, Allen G. Timko, Elsa Reichmanis, Francis M. Houlihan

المصدر: SPIE Proceedings.

مصطلحات موضوعية: chemistry.chemical_classification, Outgassing, Resist, Chemistry, Photodissociation, Analytical chemistry, Molecule, Activation energy, Polymer, Mass spectrometry, Photochemistry, Electron-beam lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a55a656298097be34f8fb044b1c1fee2
https://doi.org/10.1117/12.350209

المؤلفون: Sydney G. Slater, Richard S. Hutton, Arturo N. Medina, Ilya L. Rushkin, Omkaram Nalamasu, Mark Neisser, Allen H. Gabor, Francis M. Houlihan, Elsa Reichmanis, Janet M. Kometani, Allen G. Timko

المصدر: SPIE Proceedings.

مصطلحات موضوعية: chemistry.chemical_classification, Acrylate, Materials science, Silicon, Maleic anhydride, chemistry.chemical_element, Substrate (electronics), Polymer, chemistry.chemical_compound, Resist, chemistry, Polymerization, Polymer chemistry, Moiety

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2efabdb4900b9b020979734374aa82b8
https://doi.org/10.1117/12.350241

المؤلفون: Omkaram Nalamasu, Raymond A. Cirelli, James R. Sweeney, Sydney G. Slater, Richard S. Hutton, Gary Dabbagh, Elsa Reichmanis, Francis M. Houlihan, Ilya L. Rushkin, Allen H. Gabor, Allen G. Timko, Ruey H. Wang, Mark Neisser, Arturo N. Medina, Ognian N. Dimov

المصدر: SPIE Proceedings.

مصطلحات موضوعية: chemistry.chemical_classification, Acrylate, Materials science, Silicon, chemistry.chemical_element, Nanotechnology, Polymer, Outgassing, chemistry.chemical_compound, chemistry, Resist, Etching (microfabrication), Photomask, Composite material, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ee20703e23287b49a9dc3c7a7e0a1bae
https://doi.org/10.1117/12.350205