المؤلفون: Maksim N. Chagin, Veronica S. Sulyaeva, Vladimir R. Shayapov, Aleksey N. Kolodin, Maksim N. Khomyakov, Irina V. Yushina, Marina L. Kosinova

المصدر: Coatings; Volume 12; Issue 1; Pages: 80

مصطلحات موضوعية: tetramethyldisilazane, silicon carbonitride, thin films, inductive coupling plasma chemical vapor deposition (ICP CVD), aging of films, film stability

وصف الملف: application/pdf

Relation: Thin Films; https://dx.doi.org/10.3390/coatings12010080

الاتاحة: https://doi.org/10.3390/coatings12010080