المؤلفون: Aasutosh Dave, Qingwei Liu, Cynthia Zhu, Liguo Zhang, Yu Zhu, Feng Shao, Verne Xu, Omar El-Sewefy, Xuelong Shi, Jojo Pei

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Design modification, Resolution enhancement technologies, Computer engineering, Computer science, media_common.quotation_subject, Real-time computing, Compatibility (mechanics), Fidelity, Foundry, Adaptability, media_common

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4124a8c2c654499eca20919b6dd932e1
https://doi.org/10.1117/12.2013704

المؤلفون: Omar El-Sewefy, Pat LaCour, GekSoon Chua, Dongqing Zhang, Vlad Liubich, Aasutosh Dave, Alvin Chua, Ying Gong, YeeMei Foong, Alex Tritchkov, Jacky Cheng, Robin Chia

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Development (topology), Resolution enhancement technologies, Flow (mathematics), Resist, Process (engineering), Computer science, Distributed computing, Emphasis (telecommunications), Hardware_INTEGRATEDCIRCUITS, Selection (genetic algorithm), Simulation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::775e8853fdca53bffa0a96622b712946
https://doi.org/10.1117/12.2013605

المؤلفون: Cynthia Zhu, Suk-Joo Lee, Ja-hum Ku, John L. Sturtevant, Thuy Do, Juhwan Kim, Aasutosh Dave, Jaeyeol Maeng, Uwe Hollerbach, Yuri Granik, No-Young Chung, Min-Chul Oh, Sunwook Jung, Kostas Adam, Hyung-Joo Youn

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Edge (geometry), Chip, law.invention, Notching, Optics, Resist, law, Thin-film interference, Node (circuits), Photolithography, business, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c241c0acb297c484af10504a959e0fe1
https://doi.org/10.1117/12.917984

المؤلفون: Aasutosh Dave, John L. Sturtevant, Kenji Yoshimoto

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Physics, Bending (metalworking), Resist, Extreme ultraviolet lithography, Line (geometry), Collapse (topology), Nanotechnology, Node (circuits), Mechanics, Aspect ratio (image), Design for manufacturability

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cf7122f9d51ce66c64c8be222f20aa97
https://doi.org/10.1117/12.917885

المؤلفون: Uwe Hollerbach, Aasutosh Dave, John L. Sturtevant

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Engineering, business.industry, Capillary action, Mechanical models, Hotspot (geology), Structural engineering, Mechanics, Photoresist, business, Chip, Fundamental interaction, Random logic, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e8ac89ee5dd5767bfe03112e874712e1
https://doi.org/10.1117/12.898494

المؤلفون: Byung-Sung Kim, Scott M. Mansfield, Moutaz Fakhry, Gandharv Bhatara, David O. S. Melville, Tadanobu Inoue, Jason E. Meiring, Bruce Durgan, Henning Haffner, Young O. Kim, Alexander Wei, Jaione Tirapu-Azpiroz, Aasutosh Dave, Alexander Tritchkov, Kehan Tian, Masaharu Sakamoto, Alan E. Rosenbluth, Gabriel Berger, Kostas Adam

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Resolution enhancement technologies, Computer engineering, Computer science, law, Real-time computing, Hardware_INTEGRATEDCIRCUITS, Leverage (statistics), Node (circuits), Photolithography, Lithography, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::20e4e990a92d7e65fc9d9acdeacea47c
https://doi.org/10.1117/12.879703

المؤلفون: Yutaka Hojyo, Tim Lin, Aasutosh Dave, Thuy Do, Hiroyuki Shindo, John L. Sturtevant, Daisuke Hibino, Ir Kusnadi

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Contouring, Optical proximity correction, business.industry, Computer science, Computational lithography, Calibration, Computer vision, Wafer, Artificial intelligence, business, Lithography, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::286781fc19342b4a3d03ac3f020cfe17
https://doi.org/10.1117/12.879030

المؤلفون: Aasutosh Dave, Rachit Gupta, Edita Tejnil, Pat LaCour, Srividya Jayaram

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Computer engineering, Computer science, law, Process window, Photolithography, Lithography, Simulation, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a0504f64a50b596784efc32a77bb4357
https://doi.org/10.1117/12.879492

المؤلفون: Young O. Kim, Emily Gallagher, Yuri Granik, Kafai Lai, Daniele Paolo Scarpazza, Nick Cobb, Tom Faure, Lei Zhuang, Saeed Bagheri, Alan E. Rosenbluth, Greg McIntyre, Laszlo Ladanyi, Andreas Waechter, Geoffrey W. Burr, Moutaz Fakhry, Michael Lam, Francisco Barahona, Jason E. Meiring, Kehan Tian, David O. S. Melville, Aasutosh Dave, Phil Strenski, Jon Lee, Jaione Tirapu-Azpiroz, Alexander Tritchkov, Hidemasa Muta, Masaharu Sakamoto, Tadanobu Inoue, Azalia A. Krasnoperova, Gabriel Berger, Alfred Wagner, Kostas Adam, Mike Hibbs, Daniel Corliss, Scott Halle

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Reduction (complexity), Optics, Optical proximity correction, business.industry, Computer science, law, Electronic engineering, Off-axis illumination, Surface finish, Photolithography, business, Lithography, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8973f93c622631fa266efeaff0ea8024
https://doi.org/10.1117/12.846716

المؤلفون: Aasutosh Dave, Omar El-Sewefy, John L. Sturtevant, Pat LaCour, Srividya Jayaram

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Pixel, Computer science, business.industry, law, ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION, Process (computing), Computer vision, Process window, Artificial intelligence, Photolithography, business, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0fdf7579f49d7a1b1d3642b5eea1acaa
https://doi.org/10.1117/12.846620

المؤلفون: Aasutosh Dave, Pat LaCour, Dyiann Chou, Omar El Sewefy

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Engineering drawing, Engineering, business.industry, Hot spot (veterinary medicine), Rule-based system, computer.software_genre, Expert system, Matrix (mathematics), Decomposition (computer science), Multiple patterning, Node (circuits), business, Algorithm, computer, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9f9cc2f5a9eac3598ae8e02802c1666c
https://doi.org/10.1117/12.837204

المؤلفون: Steven J. Holmes, Harry J. Levinson, Aasutosh Dave, Jason E. Meiring, Matthew E. Colburn, Vito Dai, Ryoung-han Kim, Scott Halle

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Transistor, Chip, law.invention, Design for manufacturability, Numerical aperture, law, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Node (circuits), Process window, Photolithography, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6da58821c079c9e4cd2cc0a61e05e79f
https://doi.org/10.1117/12.814277

المؤلفون: Kenji Yoshimoto, Jiangtao Hu, Jie Li, Aasutosh Dave, Oleg Kritsun, Yunfei Deng

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Computer science, business.industry, Noise (signal processing), law.invention, Metrology, Optics, Optical proximity correction, Resist, law, Electronic engineering, Calibration, Node (circuits), Photolithography, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c537da890748f3c317dff74eceee0e45
https://doi.org/10.1117/12.814955

المؤلفون: Ryoung-han Kim, Aasutosh Dave

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Resolution enhancement technologies, business.industry, Computer science, media_common.quotation_subject, Extreme ultraviolet lithography, Fidelity, law.invention, Numerical aperture, Optics, law, Extreme ultraviolet, Electronic engineering, Process window, Node (circuits), Photolithography, business, Lithography, media_common

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7cc103a762b903dbc55b1965174228f8
https://doi.org/10.1117/12.814345

المؤلفون: Aasutosh Dave, Donald P. Butler, Zeynep Celik-Butler

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Microelectromechanical systems, Materials science, business.industry, Optical engineering, Bolometer, Microbolometer, Yttrium barium copper oxide, law.invention, Surface micromachining, chemistry.chemical_compound, chemistry, law, Transmittance, Optoelectronics, Wafer, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b2110e0a5797f8da4304c1edcb5a1873
https://doi.org/10.1117/12.603795

المؤلفون: Donald P. Butler, Aasutosh Dave, Aamer Mahmoud, Zeynep Celik-Butler

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Yttrium barium copper oxide, Vacuum packing, chemistry.chemical_compound, Thermal conductivity, chemistry, Figure of merit, Optoelectronics, Wafer, business, Wafer-level packaging, Temperature coefficient, Polyimide

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e6bc84253934c010c2a9511c2873ceaf
https://doi.org/10.1117/12.542680

المؤلفون: Steven J. Holmes, Harry J. Levinson, Matthew E. Colburn, Scott Halle, Jason E. Meiring, Vito Dai, Aasutosh Dave, Ryoung-han Kim

المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS. 9:013001

مصطلحات موضوعية: Materials science, Resolution enhancement technologies, business.industry, Mechanical Engineering, Transistor, Nanotechnology, Condensed Matter Physics, Chip, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, law.invention, Design for manufacturability, Optical proximity correction, law, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Process window, Electrical and Electronic Engineering, Photolithography, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::04de7b904ac6d188a16d6df78db875fb
https://doi.org/10.1117/1.3302125