المؤلفون: Mahaboobbatcha Aleem (11450006), Ramakirshnan Vishnuraj (11450009), Balachander Krishnan (11450012), Biji Pullithadathil (1499611)

مصطلحات موضوعية: Medicine, Biotechnology, Space Science, Biological Sciences not elsewhere classified, Chemical Sciences not elsewhere classified, Physical Sciences not elsewhere classified, silicon solar cells, investigation also addresses, friendly aluminum paste, commercial ag screen, 420 ° c, cell processing complications, ready strategic process, printed solar cells, could effectively reduce, ∼ 100 nm, ohmic contact formation, cell efficiency enhancement, average cell efficiency, nickel seed layer, based narrow line, 87 μω cm, 2 , seed layer, narrow line, cell performance, printed metallization, metallization process, could exhibit, ∼ 1

Relation: https://figshare.com/articles/journal_contribution/Realization_of_Micropatterned_Narrow_Line-Width_Ni_Cu_Sn_Front_Contact_Grid_Pattern_Using_Maskless_Direct-Write_Lithography_for_Industrial_Silicon_Solar_Cells/16636250

الاتاحة: https://doi.org/10.1021/acsaem.1c01699.s001