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1Academic Journal
المؤلفون: Xuexiang Zhang, Qingkun Li, Lei Cao, Qingzhu Zhang, Renjie Jiang, Peng Wang, Jiaxin Yao, Huaxiang Yin
المصدر: IEEE Journal of the Electron Devices Society, Vol 13, Pp 86-92 (2025)
مصطلحات موضوعية: Gate-all-around nanosheet transistor (GAA NSFET), source/drain (S/D) doping, spacer, lightly doped drain (LDD), 6T static random-access memory (6T-SRAM), Electrical engineering. Electronics. Nuclear engineering, TK1-9971
وصف الملف: electronic resource