المؤلفون: ZHUYan(朱炎), DIGuo-qing(狄国庆), CHENYa-jie(陈亚杰), ZHAODeng-tao(赵登涛)

المصدر: Zhejiang Daxue xuebao. Lixue ban, Vol 29, Iss 4, Pp 395-399 (2002)

مصطلحات موضوعية: 磁场梯度, 磁镜, 磁控溅射, 辉光, 厚度梯度, Electronic computers. Computer science, QA75.5-76.95, Physics, QC1-999

وصف الملف: electronic resource

Relation: https://doaj.org/toc/1008-9497

URL الوصول: https://doaj.org/article/ef91afbfee9d4283a3661922c463641a

المؤلفون: 陈善宝, 林更琪, 方罗珍, 吴爱清

المصدر: Guangtongxin yanjiu, Vol , Pp 46-49 (1998)

مصطلحات موضوعية: 磁控溅射, 金属吸收膜, 光吸收, Applied optics. Photonics, TA1501-1820

وصف الملف: electronic resource

Relation: http://www.gtxyj.com.cn/thesisDetails#10.13756/j.gtxyj.1998.01.011; https://doaj.org/toc/1005-8788

URL الوصول: https://doaj.org/article/a6093c1eeaa549bf80bb85b2db4641ca

المؤلفون: 曾明亮

المساهمون: 夏原

مصطلحات موضوعية: 高功率脉冲磁控溅射, TiN, 等离子体特性, 离子辐照, 残余应力

Relation: http://dspace.imech.ac.cn/handle/311007/95103

الاتاحة: http://dspace.imech.ac.cn/handle/311007/95103

المؤلفون: 冯润东, 张文伟

مصطلحات موضوعية: 各向异性磁电阻, NiFe薄膜, 基底, 磁控溅射, X射线衍射

Relation: 真空科学与技术学报; http://ir.opt.ac.cn/handle/181661/95737

الاتاحة: http://ir.opt.ac.cn/handle/181661/95737

المؤلفون: Ying J, Zhang XW, Yin ZG, Tan HR, Zhang SG, Fan YM, Ying, J, Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China. xwzhang@semi.ac.cn

مصطلحات موضوعية: High-pressure Synthesis, Vapor-deposition, Nucleation, Emission, Diamond, Growth, 半导体材料, ion beam lithography, vapor-plating, development, 溅射, focused ion beam technology, fib etching, fib technology, focused ion beam etching, ion beam applications, ion beam assisted deposition, ibad, ion lithography, ionised cluster beam deposition, ionized cluster beam deposition, sputter etching, ion etching, plasma ashing, plasma etching, reactive ion etching, reactive sputter etching, rie, sputtering, cathodic sputtering

Relation: JOURNAL OF APPLIED PHYSICS; Ying J; Zhang XW; Yin ZG; Tan HR; Zhang SG; Fan YM.Electrical transport properties of the Si-doped cubic boron nitride thin films prepared by in situ cosputtering,JOURNAL OF APPLIED PHYSICS,2011,109(2):Article no.23716; http://ir.semi.ac.cn/handle/172111/21299

الاتاحة: http://ir.semi.ac.cn/handle/172111/21299

المؤلفون: Zheng J, Zuo YH, Wang W, Tao YL, Xue CL, Cheng BW, Wang QM, Zheng, J, Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, A35 QingHua E Rd, Beijing 100083, Peoples R China. zhengjun@semi.ac.cn

مصطلحات موضوعية: Multilayers, Inorganic Compounds, Sputtering, Optical Properties, Doped Si/sio2 Superlattices, Erbium Silicate, Er3++, Luminescence, Films, Photoluminescence, 光电子学, ion beam lithography, photography--films, finite volume method, compounds, inorganic, inorganic chemicals, 溅射, focused ion beam technology, fib etching, fib technology, focused ion beam etching, ion beam applications, ion beam assisted deposition, ibad, ion lithography, ionised cluster beam deposition, ionized cluster beam deposition, sputter etching, ion etching

Relation: MATERIALS RESEARCH BULLETIN; Zheng J; Zuo YH; Wang W; Tao YL; Xue CL; Cheng BW; Wang QM.Efficient 1.53 mu m emission and energy transfer in Si/Er-Si-O multilayer structure,MATERIALS RESEARCH BULLETIN,2011,46(2):262-265; http://ir.semi.ac.cn/handle/172111/21011

الاتاحة: http://ir.semi.ac.cn/handle/172111/21011

المؤلفون: Zheng J, Tao YL, Wang W, Zhang LZ, Zuo YH, Xue CL, Cheng BW, Wang QM, Zheng, J, Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China. zhengjun@semi.ac.cn

مصطلحات موضوعية: Luminescence, Optical Materials And Properties, Sputtering, Thin Films, Photoluminescence, Er3++, 光电子学, ion beam lithography, 发光, emission spectra, candoluminescence, ionoluminescence, stokes law (optical), triboluminescence, mechanoluminescence, infrared luminescence, glow, noctilucence, phosphorescence, 摩擦发光, 溅射, focused ion beam technology, fib etching, fib technology, focused ion beam etching, ion beam applications, ion beam assisted deposition, ibad, ion lithography, ionised cluster beam deposition

Relation: MATERIALS LETTERS; Zheng J; Tao YL; Wang W; Zhang LZ; Zuo YH; Xue CL; Cheng BW; Wang QM.Highly efficient 1.53 mu m luminescence in ErxYb2-xSi2O7 thin films grown on Si substrate,MATERIALS LETTERS,2011,65(5):860-862; http://ir.semi.ac.cn/handle/172111/20985

الاتاحة: http://ir.semi.ac.cn/handle/172111/20985

المؤلفون: Ying J (Ying J.), Zhang XW (Zhang X. W.), Fan YM (Fan Y. M.), Tan HR (Tan H. R.), Yin ZG (Yin Z. G.), Zhang, XW, CAS, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China. xwzhang@semi.ac.cn

مصطلحات موضوعية: Cubic Boron Nitride, Doping, Ion Beam Assisted depositIon, X-ray Photoelectron Spectroscopy, Ray Photoelectron-spectroscopy, Vapor-deposition, Si, Nucleation, Growth, 半导体材料, ion beam lithography, photoelectron spectroscopy, vapor-plating, metric system, silicon, development, 掺杂, 溅射, focused ion beam technology, fib etching, fib technology, focused ion beam etching, ion beam applications, ibad, ion lithography, ionised cluster beam deposition, ionized cluster beam deposition, sputter etching, ion etching, plasma ashing

Relation: DIAMOND AND RELATED MATERIALS; Ying J (Ying J.), Zhang XW (Zhang X. W.), Fan YM (Fan Y. M.), Tan HR (Tan H. R.), Yin ZG (Yin Z. G.).Effects of silicon incorporation on composition, structure and electric conductivity of cubic boron nitride thin films.DIAMOND AND RELATED MATERIALS,2010,19(11):1371-1376; http://ir.semi.ac.cn/handle/172111/20684

الاتاحة: http://ir.semi.ac.cn/handle/172111/20684

المؤلفون: Fan YM, Zhang XW, You JB, Tan HR, Chen NF, Zhang XW Chinese Acad Sci Inst Semicond Key Lab Semicond Mat Sci Beijing 100083 Peoples R China. E-mail Address: xwzhang@semi.ac.cn

مصطلحات موضوعية: Cubic Boron Nitride, Stress Relaxation, Ion Beam Assisted depositIon, Fourier Transformed Infrared Spectroscopy, 半导体材料, ion beam lithography, 应力松弛, relaxation, stress, relaxation (stress), relaxation apres tension, spannungsrelaxation, 溅射, focused ion beam technology, fib etching, fib technology, focused ion beam etching, ion beam applications, ibad, ion lithography, ionised cluster beam deposition, ionized cluster beam deposition, sputter etching, ion etching, plasma ashing, plasma etching, reactive ion etching, reactive sputter etching, rie, sputtering

Relation: SURFACE & COATINGS TECHNOLOGY; Fan YM; Zhang XW; You JB; Tan HR; Chen NF .Comparison and combination of several stress relief methods for cubic boron nitride films deposited by ion beam assisted deposition ,SURFACE & COATINGS TECHNOLOGY,2009 ,203(10-11):1452-1456; http://ir.semi.ac.cn/handle/172111/7347

الاتاحة: http://ir.semi.ac.cn/handle/172111/7347

المؤلفون: 关利浩, 王超, 张望, 蔡雨露, 李凯, 林雨青, GUAN Li-hao, WANG Chao, ZHANG Wang, CAI Yu-lu, LI Kai, LIN Yu-qing

المصدر: http://electrochem.xmu.edu.cn/CN/abstract/abstract10534.shtml.

مصطلحات موضوعية: 离子溅射, 化学沉积, 金纳米电极, 活体分析, 多巴胺, ion sputtering, wet deposition, gold nanoelectrode, in vivo, dopamine

Relation: 电化学分析传感专辑; Special Issue: Electrochemical Analysis and Sensing; 电化学,2019,25(02):244-251.; http://dx.doi.org/10.13208/j.electrochem.181042; https://dspace.xmu.edu.cn/handle/2288/171242

الاتاحة: https://doi.org/10.13208/j.electrochem.181042
https://dspace.xmu.edu.cn/handle/2288/171242

المؤلفون: Liu LF, Chen NF, Wang Y, Zhang X, Yin ZG, Yang F, Chai CL, Liu, LF, Peking Univ, Inst Microelect, Novel Devices Grp, Beijing 100871, Peoples R China. E-mail: lfliu@ime.pku.edu.cn

مصطلحات موضوعية: Magnetron Sputtering, Mnxge1-x, Ferromagnetism, N-type Ge, Semiconductor, Spintronics, 半导体材料, ion beam lithography, 溅射, focused ion beam technology, fib etching, fib technology, focused ion beam etching, ion beam applications, ion beam assisted deposition, ibad, ion lithography, ionised cluster beam deposition, ionized cluster beam deposition, sputter etching, ion etching, plasma ashing, plasma etching, reactive ion etching, reactive sputter etching, rie, sputtering, cathodic sputtering, dc sputtering, diode sputtering

Relation: SOLID STATE COMMUNICATIONS; Liu LF; Chen NF; Wang Y; Zhang X; Yin ZG; Yang F; Chai CL .Growth and properties of magnetron cosputtering grown Mn(x)Ge(1-x)on Si(001) ,SOLID STATE COMMUNICATIONS,2006,137(3):126-128; http://ir.semi.ac.cn/handle/172111/10886

الاتاحة: http://ir.semi.ac.cn/handle/172111/10886

المؤلفون: Liu LF, Chen NF, Wang Y, Yin ZG, Yang F, Chai CL, Zhang X, Liu, LF, Peking Univ, Inst Microelect, Beijing 100871, Peoples R China. E-mail: lfliu@ime.pku.edu.cn

مصطلحات موضوعية: Mn Doping, Magnetron Sputtering, Mnxsi1-x, Diluted Magnetic, Thin-films, Spin-photonics, Semiconductors, Growth, Ferromagnetism, Spintronics, 半导体材料, ion beam lithography, thin films, development, 溅射, focused ion beam technology, fib etching, fib technology, focused ion beam etching, ion beam applications, ion beam assisted deposition, ibad, ion lithography, ionised cluster beam deposition, ionized cluster beam deposition, sputter etching, ion etching, plasma ashing, plasma etching, reactive ion etching

Relation: JOURNAL OF CRYSTAL GROWTH; Liu LF; Chen NF; Wang Y; Yin ZG; Yang F; Chai CL; Zhang X .Investigation of Mn-doped Si films prepared by magnetron cosputtering ,JOURNAL OF CRYSTAL GROWTH,2006,291(1):239-242; http://ir.semi.ac.cn/handle/172111/10620

الاتاحة: http://ir.semi.ac.cn/handle/172111/10620

المؤلفون: Liu JW, Xie FQ, Zhong DY, Wang EG, Liu WX, Li SF, Yang H, Liu JW,Chinese Acad Sci,Inst Phys,State Key Lab Surface Phys,POB 603,Beijing 100080,Peoples R China.

مصطلحات موضوعية: Luminescence, Sic, Nanocrystalline Film, Rf Sputtering, Raman-scattering, 半导体物理, ion beam lithography, raman effect, 发光, emission spectra, candoluminescence, ionoluminescence, stokes law (optical), triboluminescence, mechanoluminescence, infrared luminescence, glow, noctilucence, phosphorescence, 摩擦发光, self-interaction correction, 溅射, focused ion beam technology, fib etching, fib technology, focused ion beam etching, ion beam applications, ion beam assisted deposition, ibad, ion lithography

Relation: CHINESE PHYSICS; Liu JW; Xie FQ; Zhong DY; Wang EG; Liu WX; Li SF; Yang H .Photoluminescence of nanocrystalline SiC films prepared by rf magnetron sputtering ,CHINESE PHYSICS,2001 ,10(Suppl.S.):S36-S39; http://ir.semi.ac.cn/handle/172111/12108

الاتاحة: http://ir.semi.ac.cn/handle/172111/12108

المؤلفون: He HB, Fan ZX, Yao ZY, Tang ZS, Fan ZX,Chinese Acad Sci,Shanghai Inst Opt & Fine Mech,Shanghai 201800,Peoples R China.

مصطلحات موضوعية: Light Emitting Material, Zno, Magnetron Sputtering, Structure, X-ray Rocking Curve, Films, Growth, 半导体材料, ion beam lithography, photography--films, finite volume method, development, 溅射, focused ion beam technology, fib etching, fib technology, focused ion beam etching, ion beam applications, ion beam assisted deposition, ibad, ion lithography, ionised cluster beam deposition, ionized cluster beam deposition, sputter etching, ion etching, plasma ashing, plasma etching, reactive ion etching, reactive sputter etching, rie

Relation: SCIENCE IN CHINA SERIES E-TECHNOLOGICAL SCIENCES; He HB; Fan ZX; Yao ZY; Tang ZS .Sputtering of ZnO buffer layer on Si for GaN blue light emitting materials ,SCIENCE IN CHINA SERIES E-TECHNOLOGICAL SCIENCES,2000,43(1):55-59; http://ir.semi.ac.cn/handle/172111/12682

الاتاحة: http://ir.semi.ac.cn/handle/172111/12682

المؤلفون: 包秀丽, 张亮, 蔡云萍

مصطلحات موضوعية: LaCoO3薄膜, 磁控溅射, 退火温度, 热电特性

Relation: 原子与分子物理学报,2018,35(06):958-962; https://dspace.xmu.edu.cn/handle/2288/173650

الاتاحة: https://dspace.xmu.edu.cn/handle/2288/173650

المؤلفون: 肖舒, 吴忠振, 崔岁寒, 刘亮亮, 郑博聪, 林海, 傅劲裕, 田修波, 朱剑豪, 潘锋

المساهمون: 北京大学深圳研究生院新材料学院, 香港城市大学物理与材料科学系

المصدر: 知网

مصطلحات موضوعية: 高功率脉冲磁控溅射, 筒内放电, 电子阻挡屏极, 磁场补偿

Relation: 珠三角光电产业与真空科技创新论坛暨广东省真空学会2016年学术年会. 2016, 11.; 1939933; http://hdl.handle.net/20.500.11897/485444

الاتاحة: https://hdl.handle.net/20.500.11897/485444

المؤلفون: 赵璐

المساهمون: 张韵

مصطلحات موضوعية: 溅射aln+algan基深紫外led+大规模生产+低成本, 半导体材料, 半导体器件, 光电子学

Relation: 赵璐.基于溅射AlN模板的深紫外LED制备技术的研究[硕士].北京.中国科学院研究生院.2018; http://ir.semi.ac.cn/handle/172111/28337

الاتاحة: http://ir.semi.ac.cn/handle/172111/28337

المؤلفون: 周磊, 诸一琦, 苏江滨, 刘阳, 郎咸忠, 蒋美萍, 唐斌, 朱贤方, 曾祥明

مصطلحات موضوعية: 多孔纳米结构薄膜, 平衡磁控溅射, 负偏置沉积, Cu_2O, porous nanostructured films, balanced magnetron, sputtering, negative bias deposition

Relation: 科学通报,2017,(26):3050-3056; https://dspace.xmu.edu.cn/handle/2288/165572

الاتاحة: https://dspace.xmu.edu.cn/handle/2288/165572

المؤلفون: 周磊, 诸一琦, 苏江滨, 刘阳, 郎咸忠, 蒋美萍, 唐斌, 朱贤方, 曾祥明

مصطلحات موضوعية: Cu2O, 多孔纳米结构薄膜, 平衡磁控溅射, 负偏置沉积

Relation: 科学通报,2017,(26); https://dspace.xmu.edu.cn/handle/2288/165571

الاتاحة: https://dspace.xmu.edu.cn/handle/2288/165571

المؤلفون: 崔岁寒, 吴忠振, 肖舒, 刘亮亮, 郑博聪, 林海, 傅劲裕, 田修波, 朱剑豪, 谭文长, 潘锋

المساهمون: Wu, ZZ (reprint author), Peking Univ, Sch Adv Mat, Shenzhen Grad Sch, Shenzhen 518055, Peoples R China., 北京大学深圳研究生院新材料学院,深圳,518055, 香港城市大学物理与材料科学系,香港,999077

المصدر: CSCD ; SCI ; 万方 ; 知网 ; http://d.g.wanfangdata.com.cn/Periodical_wlxb201709030.aspx

مصطلحات موضوعية: 高功率脉冲磁控溅射 筒内放电 电子阻挡屏极 磁场补偿 high power impulse magnetron sputtering discharge in cylindrical source electron blocking plate magnetic field compensation, high power impulse magnetron sputtering, discharge in cylindrical source, electron blocking plate, magnetic field compensation

Relation: 物理学报. 2017, 66(9), 280-288.; 1901677; http://hdl.handle.net/20.500.11897/467907; WOS:000403077300030

الاتاحة: https://hdl.handle.net/20.500.11897/467907
https://doi.org/10.7498/aps.66.095203