المؤلفون: Alireza Abrand (7871498), Mohadeseh A. Baboli (5595809), Anastasiia Fedorenko (11976795), Stephen J. Polly (11976798), Evan Manfreda-Schulz (11976801), Seth M. Hubbard (11976804), Parsian K. Mohseni (1674745)

مصطلحات موضوعية: Biotechnology, Ecology, Plant Biology, Computational Biology, Environmental Sciences not elsewhere classified, Chemical Sciences not elsewhere classified, template pattern fidelity, remnant base segments, flexible membrane devices, dark current ratio, >- line lithography, scale inas nanowire, original growth run, modulated growth sequence, epitaxial growth technique, based photodetectors produce, 500 nm pore, parent wafers act, original nw position, reusable si substrates, reusable si wafers, inas nanowire arrays, fabrication procedure employed, grown nw arrays, 2 , si substrates, si wafers, inas lattice, growth masks, free photodetectors

Relation: https://figshare.com/articles/journal_contribution/Localized_Self-Assembly_of_InAs_Nanowire_Arrays_on_Reusable_Si_Substrates_for_Substrate-Free_Optoelectronics/18741072

الاتاحة: https://doi.org/10.1021/acsanm.1c03557.s001

المؤلفون: Joanna Prazmowska, Kornelia Indykiewicz, Bogdan Paszkiewicz, Regina Paszkiewicz

المصدر: Advances in Electrical and Electronic Engineering, Vol 15, Iss 2, Pp 358-364 (2017)

مصطلحات موضوعية: algan/gan transistors, h-line lithography, proximity effect., Electrical engineering. Electronics. Nuclear engineering, TK1-9971

وصف الملف: electronic resource

Relation: http://advances.utc.sk/index.php/AEEE/article/view/2024; https://doaj.org/toc/1336-1376; https://doaj.org/toc/1804-3119

URL الوصول: https://doaj.org/article/86f1438baad64176bde2a1fc5fcfc453

المؤلفون: H. Iimori, H. Ishii, M. Ueda, Y. Shibasaki

المصدر: Journal of Photopolymer Science and Technology. 2003, 16(5):685

المؤلفون: Masakatsu OHTA, 太田 正克

المصدر: 計測と制御 / Journal of The Society of Instrument and Control Engineers. 1993, 32(6):456

المؤلفون: Noroozi, Mohammad, Ergül, Adem, Abedin, Ahmed, Toprak, Muhammet S, 1973, Radamson, Henry

المصدر: ECS Transactions. :167-174

مصطلحات موضوعية: Focused ion beams, Germanium, Nanowires, Scanning electron microscopy, Silicides, Silicon alloys, Silicon wafers, Wire, Advanced sensors, Fib cuttings, Focus ion beam, Focused ion beam technique, I-line lithography, Nanowires (NWs), Resistivity measurement, Si-Ge nanowires, Ion beams

وصف الملف: print

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-167899

المؤلفون: Vasudevan, Ravikumar

مصطلحات موضوعية: 700258 -- adhesion -- aeruginosa -- angle -- aureus -- bacterial -- biofilm -- biomaterial -- catheter -- cauti -- characterization -- cloacae -- coating -- contact -- enterobacter -- etching -- hysteresis -- implant -- infection -- line -- lithography -- microfabrication -- morphology -- nontoxic -- pao1 -- pattern -- pcr -- pdms -- phase -- polymer -- pseudomonas -- sh1000 -- silicon -- staphylococcus -- topography -- tract -- triple -- urinary -- wetting, Materials Science and Engineering -- Dissertations, Academic, Materials Science and Engineering thesis, Ph.D

جغرافية الموضوع: UF

وصف الملف: 1 online resource (174 p.)

Relation: http://ufdc.ufl.edu/UFE0043356/00001

الاتاحة: http://ufdc.ufl.edu/UFE0043356/00001

المصدر: Physics Today. Mar81, Vol. 34 Issue 3, p71-72. 2p.

Reviews & Products: OPERATOR Methods in Quantum Mechanics (Book), FINE Line Lithography (Book), PHYSICS in Nuclear Medicine (Book), ENERGY Systems Analysis (Book)

المؤلفون: Cosslett, V.E.

المصدر: Contemporary Physics. Jul/Aug81, Vol. 22 Issue 4, p481. 2p.

مصطلحات موضوعية: *LITHOGRAPHY, *NONFICTION

Reviews & Products: FINE Line Lithography (Book)