المؤلفون: Atsuko Yamaguchi, Hiroaki Oizumi, Hiroshi Shiraishi, Takashi Hattori, Taku Morisawa, Yoshiyuki Yokoyama, Yuko Tsuchiya

المصدر: Journal of Photopolymer Science and Technology. 1999, 12(3):537

المؤلفون: Koichi Kuhara, Masaru Sasago, Masayuki Endo, Nobuyuki N. Matsuzawa, Sigeyasu Mori, Takeshi Ohfuji, Taku Morisawa, Yuko Kaimoto

المصدر: Journal of Photopolymer Science and Technology. 1998, 11(4):667

المؤلفون: Koichi Kuhara, Masaru Sasago, Masayuki Endo, Nobuyuki N. Matsuzawa, Shigeyasu Mori, Taku Morisawa, Yuko Kaimoto

المصدر: Journal of Photopolymer Science and Technology. 1998, 11(4):625

المؤلفون: Koichi Kuhara, Masaru Sasago, Masayuki Endo, Nobuyuki Matsuzawa, Shigeyasu Mori, Takahiro Matsuo, Taku Morisawa, Yuko Kaimoto

المصدر: Journal of Photopolymer Science and Technology. 1998, 11(4):613

المؤلفون: Koichi Kuhara, Masaru Sasago, Masayuki Endo, Nobuyuki Matsuzawa, Shigeyasu Mori, Takahiro Matsuo, Taku Morisawa, Yuko Kaimoto

المصدر: Journal of Photopolymer Science and Technology. 1997, 10(4):603

المؤلفون: Koichi Kuhara, Masaru Sasago, Masayuki Endo, Nobuyuki Matsuzawa, Shigeyasu Mori, Takeshi Ohfuji, Taku Morisawa, Yuko Kaimoto

المصدر: Journal of Photopolymer Science and Technology. 1997, 10(4):589

المؤلفون: Hiroshi FUKUDA, Hiroshi SHIRAISHI, Taku MORISAWA

المصدر: Journal of Photopolymer Science and Technology. 1996, 9(3):533

المؤلفون: Kiichi AMAYA, S KUMAYASU, Taku MORISAWA, Yoichi MURAKAMI, 天谷 喜一, 村上 洋一, 森沢 拓, 熊安 敏

المصدر: Meeting Abstracts of the Physical Society of Japan. 1992, :175

المؤلفون: Hideyo Yoshida, Hisashi Yamanaka, Koushi Sakuma, Masako Tomita, Minoru Odaka, Momoko Yamaguchi, Shouichi Mizuno, Takashi Murayama, Taku Morisawa, 佐久間 光史, 吉田 英世, 富田 真佐子, 小高 稔, 山中 寿, 山口 百子, 村山 隆志, 森沢 拓, 水野 正一

المصدر: プリン・ピリミジン代謝 / Purine and pyrimidine metabolism. 1998, 22(2):133

المؤلفون: Masaru Sasago, Shigeyasu Mori, Takeshi Ohfuji, Masayuki Endo, Taku Morisawa, Koichi Kuhara, Nobuyuki Matsuzawa

المصدر: Journal of Materials Chemistry. 8:853-858

مصطلحات موضوعية: chemistry.chemical_classification, Standard enthalpy of reaction, Chemistry, Relative permittivity, General Chemistry, Polymer, Photoresist, law.invention, law, Polymer chemistry, Materials Chemistry, Copolymer, Physical chemistry, Photolithography, Glass transition, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::262f8da924c5063934f1df08a3e003b9
https://doi.org/10.1039/a707225b

المؤلفون: Taku Morisawa, Taku Morisawa, Hiroshi Fukuda, Hiroshi Fukuda

المصدر: Japanese Journal of Applied Physics ; volume 35, issue 12S, page 6366 ; ISSN 0021-4922 1347-4065

الاتاحة: http://dx.doi.org/10.1143/jjap.35.6366
https://iopscience.iop.org/article/10.1143/JJAP.35.6366
https://iopscience.iop.org/article/10.1143/JJAP.35.6366/pdf

المؤلفون: Toshihiko P. Tanaka, Tsuneo Terasawa, Taku Morisawa

المصدر: Advances in Resist Technology and Processing XVII.

مصطلحات موضوعية: chemistry.chemical_classification, Materials science, Silicon, chemistry.chemical_element, Nanotechnology, Polymer, Photoresist, law.invention, Stress (mechanics), chemistry, Resist, law, Wafer, Photolithography, Composite material, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6bc2f96d5597604a07205d4fe4772449
https://doi.org/10.1117/12.388262

المؤلفون: Taku Morisawa, Hiroaki Oizumi, Hiroshi Shiraishi, Yoshiyuki Yokoyama, Yuko Tsuchiya, Atsuko Yamaguchi, Takashi Hattori

المصدر: SPIE Proceedings.

مصطلحات موضوعية: chemistry.chemical_classification, Materials science, Excimer laser, medicine.medical_treatment, Polymer, Photoresist, Photochemistry, Alicyclic compound, chemistry, Resist, Intramolecular force, Polymer chemistry, medicine, Reactivity (chemistry), Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a6c3208fd2e99aa973a1b213c8d7423f
https://doi.org/10.1117/12.350223

المؤلفون: Masahiro Tsunooka, Masamitsu Shirai, Shigeyasu Mori, Masaru Sasago, Masayuki Endo, Taku Morisawa, Koichi Kuhara, Takahiro Matsuo

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, Resist, Surface modification, Nanotechnology, X-ray lithography, Wafer, Chemical vapor deposition, Photoresist, Lithography, Electron-beam lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4fd15cc720f67f7163cb8f1476dfcb82
https://doi.org/10.1117/12.312439

المؤلفون: Shigeyasu Mori, Taku Morisawa, Yuko Kaimoto, Nobuyuki Matsuzawa, Masaru Sasago, Koichi Kuhara, Takeshi Ohfuji, Masayuki Endo

المصدر: SPIE Proceedings.

مصطلحات موضوعية: chemistry.chemical_classification, chemistry.chemical_compound, chemistry, Silylation, Computational chemistry, Carboxylic acid, Diffusion, Kinetics, Fluorine, chemistry.chemical_element, Molecular orbital, Alcohol, Activation energy

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::37a33e0fcb7c48ff86b0ef3260a34f5b
https://doi.org/10.1117/12.312361

المؤلفون: Shigeyasu Mori, Masaru Sasago, Taku Morisawa, Koichi Kuhara, Takeshi Ohfuji, Yuko Kaimoto

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Plasma etching, Silylation, Resist, Etching (microfabrication), Chemistry, Analytical chemistry, medicine, Thermal stability, Swelling, medicine.symptom, Methacrylate, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::369c93d8403adaf06946d6efb8874770
https://doi.org/10.1117/12.312407

المؤلفون: Nobuyuki Matsuzawa, Shigeyasu Mori, Yuko Kaimoto, Masaru Sasago, Taku Morisawa, Takahiro Matsuo, Masayuki Endo, Koichi Kuhara, Takeshi Ohfuji

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Silicon, business.industry, Chemistry, Scanning electron microscope, Thermal decomposition, Analytical chemistry, chemistry.chemical_element, Resist, Etching (microfabrication), Optoelectronics, business, Glass transition, Lithography, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::480cc243113d811532ea702d613d511c
https://doi.org/10.1117/12.312359

المؤلفون: Masaru Sasago, Nobuyuki Matsuzawa, Taku Morisawa, Takahiro Matsuo, Yuko Kaimoto, Koichi Kuhara, Shigeyasu Mori, Masayuki Endo

المصدر: Japanese Journal of Applied Physics. 37:6734

مصطلحات موضوعية: Surface (mathematics), Depth of focus, Fabrication, Materials science, business.industry, Resolution (electron density), General Engineering, Process (computing), General Physics and Astronomy, Optics, Line (geometry), business, Lithography, Exposure latitude

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::90614fe042934954dd834f4d7822904a
https://doi.org/10.1143/jjap.37.6734

المؤلفون: Masaru Sasago, Shigeyasu Mori, Masayuki Endo, Taku Morisawa, Takahiro Matsuo, Koichi Kuhara, Nobuyuki Matsuzawa, Yuko Kaimoto

المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 16:3744

مصطلحات موضوعية: Auger electron spectroscopy, Auger effect, business.industry, Chemistry, General Engineering, Evaporation, Substrate (electronics), Binary pattern, symbols.namesake, Optics, Resist, Etching (microfabrication), symbols, Wafer, Composite material, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::666ac5ec9ca351d1265de92009e050f6
https://doi.org/10.1116/1.590400

المؤلفون: Koichi Kuhara, Shigeyasu Mori, Nobuyuki Matsuzawa, Masaru Sasago, Yuko Kaimoto, Taku Morisawa, Takahiro Matsuo, Masayuki Endo

المصدر: Scopus-Elsevier

مصطلحات موضوعية: chemistry.chemical_classification, Materials science, chemistry, Resist, Thermal, General Engineering, food and beverages, Nanotechnology, Polymer, Composite material, Glass transition, Line edge roughness, Highly sensitive

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::82b26b5c8b8d531e7b4efa7b1ed97146
https://doi.org/10.1116/1.590409