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1
المؤلفون: Cheng-Che Hsu, David B. Graves, J. W. Coburn, Mark A Nierode
المصدر: Journal of Physics D: Applied Physics. 39:3272-3284
مصطلحات موضوعية: Electron density, Work (thermodynamics), Acoustics and Ultrasonics, Chemistry, Plasma, Electron, Condensed Matter Physics, Inductive coupling, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Ion, Physics::Plasma Physics, Physics::Space Physics, Boundary value problem, Atomic physics, Inductively coupled plasma
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2
المؤلفون: David B. Graves, C. C. Hsu, J. W. Coburn
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 24:1-8
مصطلحات موضوعية: Plasma etching, Chemistry, fungi, technology, industry, and agriculture, Analytical chemistry, macromolecular substances, Surfaces and Interfaces, Substrate (electronics), Condensed Matter Physics, Isotropic etching, Surfaces, Coatings and Films, stomatognathic system, Etching (microfabrication), Wafer, Dry etching, Reactive-ion etching, Deposition (law)
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3
المؤلفون: Yoshie Kimura, David B. Graves, J. W. Coburn
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:2508-2516
مصطلحات موضوعية: Argon, Chemistry, Radical, Analytical chemistry, Flux, chemistry.chemical_element, Surfaces and Interfaces, Condensed Matter Physics, Surfaces, Coatings and Films, Ion, Etching (microfabrication), Fluorocarbon, Thin film, Deposition (law)
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4
المؤلفون: J. W. Coburn, Jeffrey Chang
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 21:S145-S151
مصطلحات موضوعية: Physics, Plasma surface, Nanotechnology, Surfaces and Interfaces, Plasma, Condensed Matter Physics, Surfaces, Coatings and Films
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5
المؤلفون: David B. Graves, M. T. Radtke, J. W. Coburn
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 21:1038-1047
مصطلحات موضوعية: Number density, Chemistry, Analytical chemistry, Surfaces and Interfaces, Condensed Matter Physics, Mass spectrometry, Dissociation (chemistry), Surfaces, Coatings and Films, Ion, symbols.namesake, Physics::Plasma Physics, Ionization, Physics::Atomic and Molecular Clusters, symbols, Langmuir probe, Plasma diagnostics, Inductively coupled plasma, Atomic physics
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6
المؤلفون: David B. Graves, D. Fraser, Frank Greer, J. W. Coburn
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 21:96-105
مصطلحات موضوعية: Inorganic chemistry, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Quartz crystal microbalance, Substrate (electronics), Chemical vapor deposition, Condensed Matter Physics, Surfaces, Coatings and Films, Atomic layer deposition, chemistry, Vacuum deposition, X-ray photoelectron spectroscopy, Thin film, Tin
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7
المؤلفون: Eric Kay, J. W. Coburn
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 35:05C101
مصطلحات موضوعية: 010302 applied physics, Ion implantation, Chemistry, 0103 physical sciences, Nanotechnology, 02 engineering and technology, Surfaces and Interfaces, Sputter deposition, 021001 nanoscience & nanotechnology, 0210 nano-technology, Condensed Matter Physics, 01 natural sciences, Surfaces, Coatings and Films
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8
المؤلفون: Harmeet Singh, J. W. Coburn, David B. Graves
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 19:718-729
مصطلحات موضوعية: Number density, Argon, Plasma parameters, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Plasma, Condensed Matter Physics, Surfaces, Coatings and Films, Ion, chemistry, Electron temperature, Plasma diagnostics, Atomic physics, Inductively coupled plasma
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9
المؤلفون: Harmeet Singh, David B. Graves, J. W. Coburn
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 18:2680-2684
مصطلحات موضوعية: Work (thermodynamics), Chemistry, Radical, Analytical chemistry, Surfaces and Interfaces, Plasma, Condensed Matter Physics, Surfaces, Coatings and Films, Afterglow, law.invention, law, Vacuum pump, Fluorocarbon, Order of magnitude, Beam (structure)
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10
المؤلفون: David B. Graves, Harmeet Singh, J. W. Coburn
المصدر: Journal of Applied Physics. 88:3748-3755
مصطلحات موضوعية: Number density, Chemistry, Radical, technology, industry, and agriculture, Analytical chemistry, General Physics and Astronomy, Plasma, Mass spectrometry, Dissociation (chemistry), symbols.namesake, symbols, Langmuir probe, Inductively coupled plasma, Recombination
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11
المؤلفون: J. W. Coburn, Harmeet Singh, David B. Graves
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 18:299-305
مصطلحات موضوعية: Chemical ionization, Chemistry, Ionization, Analytical chemistry, Thermal ionization, Surfaces and Interfaces, Condensed Matter Physics, Mass spectrometry, Electron ionization, Ion source, Surfaces, Coatings and Films, Ambient ionization, Atmospheric-pressure laser ionization
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12
المؤلفون: David B. Graves, Harmeet Singh, J. W. Coburn
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:2447-2455
مصطلحات موضوعية: Spectrometer, Chemistry, Selected reaction monitoring, Analytical chemistry, Surfaces and Interfaces, Condensed Matter Physics, Mass spectrometry, Surfaces, Coatings and Films, Secondary ion mass spectrometry, Mass spectrum, Atomic physics, Quadrupole mass analyzer, Beam (structure), Hybrid mass spectrometer
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13
المؤلفون: Gowri P. Kota, David B. Graves, J. W. Coburn
المصدر: Journal of Applied Physics. 85:74-86
مصطلحات موضوعية: Chemical kinetics, chemistry, Heteronuclear molecule, Computational chemistry, Chemisorption, Reactive intermediate, Halogen, Fluorine, General Physics and Astronomy, chemistry.chemical_element, Photochemistry, Molecular beam, Homonuclear molecule
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14
المؤلفون: Gowri P. Kota, J. W. Coburn, David B. Graves
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:282-290
مصطلحات موضوعية: Surface diffusion, Materials science, Bromine, Silicon, Inorganic chemistry, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Tungsten, Condensed Matter Physics, Surfaces, Coatings and Films, chemistry, Chemisorption, Aluminium, Fluorine, Quartz
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15
المؤلفون: J. W. Coburn, Gowri P. Kota, David B. Graves
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 16:2215-2221
مصطلحات موضوعية: Silicon, Inorganic chemistry, technology, industry, and agriculture, chemistry.chemical_element, Surfaces and Interfaces, Condensed Matter Physics, Oxygen, Surfaces, Coatings and Films, Ion, chemistry, Etching (microfabrication), Yield (chemistry), polycyclic compounds, Chlorine, Molecule, Vacuum chamber
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16
المؤلفون: David B. Graves, Gowri P. Kota, J. W. Coburn
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 16:270-277
مصطلحات موضوعية: inorganic chemicals, Materials science, Anodizing, fungi, technology, industry, and agriculture, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Photoresist, Tungsten, engineering.material, Condensed Matter Physics, Surfaces, Coatings and Films, Polycrystalline silicon, chemistry, engineering, Vacuum chamber, Crystalline silicon, Molecular beam, Beam (structure)
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17
المؤلفون: C. W. Bishop, J. C. Knutson, A. U. Tan, J. W. Coburn, B. S. Levine, R. B. Mazess, D. M. Kyllo
المصدر: Nephrology Dialysis Transplantation. 11:153-157
مصطلحات موضوعية: Vitamin, Transplantation, medicine.medical_specialty, Hyperparathyroidism, Hypercalcaemia, Calcitriol, business.industry, Parathyroid hormone, medicine.disease, chemistry.chemical_compound, Endocrinology, chemistry, Nephrology, Internal medicine, medicine, Vitamin D and neurology, Hypercalciuria, Secondary hyperparathyroidism, business, medicine.drug
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18
المؤلفون: Charles B Mullins, J. W. Coburn
المصدر: Journal of Applied Physics. 76:7562-7566
مصطلحات موضوعية: Plasma etching, Silicon, Ion beam, Physics::Instrumentation and Detectors, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Atmospheric temperature range, Computer Science::Other, Ion, chemistry, Etching (microfabrication), Fluorine, Wafer
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19
المؤلفون: J. W. Coburn
المصدر: Applied Physics A Solids and Surfaces. 59:451-458
مصطلحات موضوعية: Surface (mathematics), Plasma etching, Physics and Astronomy (miscellaneous), Chemistry, Radical, fungi, technology, industry, and agriculture, General Engineering, Nanotechnology, General Chemistry, Plasma, Microstructure fabrication, Ion, Chemical physics, Etching (microfabrication), General Materials Science, Saturation (chemistry)
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20
المؤلفون: J. W. Coburn, Harold F. Winters
المصدر: ChemInform. 23
مصطلحات موضوعية: Glow discharge, Silicon, Chemistry, business.industry, chemistry.chemical_element, Nanotechnology, General Medicine, Engineering physics, Ion, Etching (microfabrication), Fluorine, Molecule, business, Beam (structure), Thermal energy